According to a recent press release (below) Strem Chemicals inc. in the US is now collaborating with the famous Gordon Research Group at Harvard on transition metal amidinate ALD Precursors. This collaboration includes the distribution of those precursors out of The UK and Ireland. Earlier the distribution here in Europe was through DOW but as previously reported DOW has dropped ALD precursors - so this is very good news for us here in Europe that Strem who has excellent distribution services will handle of this business here. Luckily I just got the new catalog from Strem and could look up some of these precursors including in the deal between Strem and Harvard (see pictures below).
Families of volatile metal available for use in ALD applications
Strem Chemicals Inc in the US works with Roy Gordon’s Group at Harvard University, who produce transition metal amidinates for metal, nitride and oxide layer deposition, allowing Strem Chemicals UK to distribute them in the UK and Eire.
Atomic Layer Deposition (ALD) is a vapour phase technique capable of
producing thin films of a variety of materials. As device requirements
push toward smaller and more spatially demanding structures, ALD has
demonstrated potential advantages over alternative deposition methods.
ALD offers exceptional conformity on high-aspect ratio structures,
thickness control at the angstrom level, and tunable film composition
from metal oxides to noble metals. ALD has emerged as a powerful tool
for many industrial and research applications including ferroelectric
memories, switches, radiation detectors, thin-film capacitors and
microelectromechanical structures (MEMS). They also are affording
significant improvements in solar cell devices, high-k transistors,
solid oxide fuels, protective coatings, fuel cells, + ion- batteries and
nanogratings.