Tuesday, January 5, 2016

Call for abstracts - Novel High k Application Workshop 2016, NaMLab, Dresden

In collaboration with the EU COST networking project HERALD (working group 4), NaMLab invites to the ‘Novel High-k Application Workshop’ on March 14th and 15th, 2016. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 80 participants from industry, research institutes and universities. The workshop was initiated as a stimulating European platform for application-oriented scientists to exchange ideas and discuss latest experimental results on MIM-capacitors, process technologies, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. In addition, new results in the field of ALD dielectrics in solar cells, transparent conduction oxides (TCOs) and atomic layer etching (ALE) will be discussed.

 A long list of speakers already confirmed their participation at the workshop. A preliminary program can be found here: http://www.namlab.com/news/events-1/novel-high-k-application-workshop

To participate in the workshop, please apply by the end of January 2016 with a ½ page abstract (oral or poster) describing the work you would like to present. Mail your abstract to ALD@namlab.com

Since the HERALD project aims to promote participation from new EU member countries, additional travel grants (up to €300 per person) are available. If you would like to apply for a travel grant, please state this in your email.


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