Here is a summary of the Virtual AVS ALD/ALE 2020 conference and BALD Engineering participation and Social Events during the confernece. For continued access to the presentations please see the AVS Summary below!
From the Monday invited speakers I would especially like to recommend the two talks on ALD and ALE, resp., by TEL Rob Clarke and LAM Keren Kanarik. As I have not watched all yet I will come with more review later.
Hope to meet some of you live at possibly the only live ALD Event 2020 - EFDS ALD for Industry in Freiburg Germany December 2-3, 2020 :
LINK
Summary by AVS:
Conference
Registration
was strong with 800+ for Monday's Live Plenary; nearly 600 for the Tuesday and
Wednesday Live Technical sessions; and about 360 for the Tuesday and Wednesday
Live Tutorials.
The ALD/ALE
2020 Online Scheduler and/or Mobile
App contains 258 presentations: 22 Live Oral and
Tutorial Lectures; 17 Invited Orals On Demand; 130 Contributed Orals On Demand;
89 Poster PDFs.
All
Live Technical and Tutorial Session recordings may be viewed by paid
registrants by logging into the ALD/ALE
2020 Online Scheduler and/or Mobile
App and selecting > Browse by Live
Technical/Tutorial Sessions > Select Day > Select Session > View
Recording.
Live
Monday Invited Speakers:
- Mikko Ritala (University
of Helsinki, Finland), "Meet the ALD 2020 Innovator Awardee"
- Robert Clark (TEL
Technology Center‚ America‚ LLC), "Selective and Atomic Scale
Processes to Enable Future Nano-Electronics"
- Hyun-Chul Choi (LG Display,
South Korea) "The First Application of ALD Technology in Display
Industry"
- Frank Rosowski (BASF SE‚
Germany), "ALD on Powders for Catalysis"
- Keren Kanarik (Lam
Research, USA), "The Flip Side of the Story: Atomic Layer
Etching"
Live
Tuesday Invited Speakers:
- Charles Winter (Wayne State
University, USA), "Thermal Atomic Layer Deposition of Noble Metal
Films Using Non-Oxidative Coreactants"
- ALD Student Finalist Awardee
(Winner): Jeff
Schulpen
(Eindhoven University of Technology‚ Netherlands), "Mixing It Up:
Tuning Atomic Ordering in 2-D Mo1-xWxS2 Alloys"
- ALD Student Finalist Awardee: Saba
Ghafourisaleh (University
of Helsinki‚ Finland), "Deposition of Conductive PEDOT Thin Films
with EDOT and ReCl5 Precursors"
- ALD Student Finalist Awardee: Mikhail Krishtab (KU
Leuven/Imec‚ Belgium), "Resistless Lithography Based on Local Surface
Modification of Halogenated Amorphous Carbon"
- ALD Student Finalist Awardee: Karina Ashurbekova (CIC
nanoGUNE BRTA‚ Spain), "Mimicking Chitin and Chitosan Type of
Functionality with Novel Thin Films Grown by Molecular Layer
Deposition"
Live
Tuesday Tutorial Speakers:
- Anjana Devi (Ruhr-Universität
Bochum, Germany), "ALD Precursor Chemistry: Synthetic Routes,
Purification and Evaluation of Precursors"
- Neil Dasgupta (University
of Michigan, USA), "Atomic Layer Engineering: Hardware Considerations
for ALD System Design and Process Development"
- Angel Yanguas-Gil (Argonne
National Laboratory, USA), "ALD on High Aspect Ratio and Nanostructured
Materials: from Fundamentals to Economics"
Live
Wednesday Invited Speakers:
- Noriaki Toyoda, Kota Uematsu
(University of Hyogo‚ Japan), "Surface Reactions Between Metals and
Diketone induced by Gas Cluster Ion Bombardments"
- ALE 2020 Best Student Paper Award:Nicholas Chittock (Eindhoven
University of Technology, Netherlands), "Isotropic Plasma
ALE of Al2O3Using SF6Plasma and TMA"
- Rudy Wojtecki (IBM
Research – Almaden), "Monolayer Lithography: Exploiting Inhibition
Contrast from the Extreme Ultraviolet Irradiation of Organic Monolayers
for Area Selective Depositions"
- Jean-Sebastien Lehn (EMD
Performance Materials), "Super-Conformal ALD of Metallic Mo Films by
Simultaneous Deposition and Etch"
- Jeffrey W. Elam (Argonne National
Laboratory), "Process Optimization in Atomic Layer Deposition Using
Machine Learning"
Live
Wednesday Tutorial Speakers:
- Annelies Delabie (imec,
Belgium), "Growth Mechanisms and Selectivity During Atomic Layer
Deposition"
- Simon Elliott (Schrödinger,
Ireland), "Self-Limiting Surface Reactions for Atomic-Level Control
of Materials Processing"
- Mark Kushner (University
of Michigan, USA), "Fundamentals of ALE – Optimizing Passivation and
Etch"
All On
Demand session recordings and posters may be viewed by registrants by logging
into the ALD/ALE
2020 Online Scheduler and/or Mobile
App and selecting > Browse by On Demand Sessions
> Select Topic > Select Presentation.
ALD On
Demand Invited Speakers:
- Julien Bachmann (University of
Erlangen, Germany), “ALD from Dissolved Precursors: Same Principles,
Original Materials”
- Bram Hoex (UNSW Photovoltaic
& Renewable Energy Engineering, Australia), “ALD Enabling
High-Efficiency Solar Cells”
- Andrew Kummel (University of
California, San Diego, USA), “Deposition of High Thermal Conductivity AlN
Heat Spreader Films”
- Mark Losego (Georgia Tech,
USA), “Vapor Phase Infiltration for Transforming Polymers into Organic Inorganic
Hybrid Materials: Process Thermodynamics and Kinetics”
- Catherine Marichy (University Lyon,
France), “ALD of BN for Membrane Application in Water Treatment”
- Miika Mattinen (Uhelsinki,
Finland), “Exploring ALD 2D Chalcogenides Beyond MoS2”
- Toshihide Nabatame (National
Institute for Materials Science, Japan), “Study of ALD HfO2-Based
High-k for GaN Power Devices and Ferroelectric Devices”
- Nathanaelle
Schneider
(CNRS, France), “Tuning Properties of ALD Oxide and Sulfide Materials for
Photovoltaic Applications”
- Mahdi Shirazi (Eindhoven, The
Netherlands), “Atomistic Simulation of 2D-TMDs Growth by ALD”
- Henrik Soensteby (University of
Oslo, Norway), “Low-temperature Epitaxy of Complex Oxides”
- Matthias Young (University of
Missouri, USA), “From the Noise: Measuring Atomic Structure in Amorphous
Thin Films Grown by Atomic Layer Deposition”
ALE
On Demand Invited Speakers:
- Sumiko Fujisaki (Hitachi Ltd.,
Research & Development Group, Japan), “Thermal ALE of Co by
Organometallic Complexes”
- Akiko Hirata (Sony
Semiconductor Solutions Corp., Japan), “Highly Selective Atomic Layer
Etching for Semiconductor Application”
- Anil Mane (Argonne National
Lab, USA), “Novel Chemistries for Layer-by-Layer Etching of 2D
Semiconductor Coatings and Organic-Inorganic Hybrid Materials”
- Gottlieb Oehrlein (University of
Maryland, USA), “Achieving Selective Material Removal in Plasma-Based
Atomic Layer Etching (ALE) of SiO2”
- Simon Ruel (CEA-LETI,
France), “GaN Damage Evaluation After Conventional Plasma Etching and
Anisotropic Atomic Layer Etching”
- Andrew Teplyakov (University of
Delaware, USA), “Mechanistic Insights into Thermal Dry Atomic Layer
Processing of Metals”
Congratulations
to the ALD 2020 Innovator Awardee Mikko Ritala, University of
Helsinki, Finland
Congratulations
to the following Student Awardees. Be sure to view their presentation recordings.
ALD
2020 Best Student Paper Awardee:
- Jeff Schulpen (Eindhoven
University of Technology‚ Netherlands), "Mixing It Up: Tuning Atomic
Ordering in 2-D Mo1-xWxS2 Alloys"
ALD
2020 Student Finalists:
- Saba Ghafourisaleh (University
of Helsinki‚ Finland), "Deposition of Conductive PEDOT Thin Films
with EDOT and ReCl5 Precursors"
- Mikhail Krishtab (KU
Leuven/Imec‚ Belgium), "Resistless Lithography Based on Local Surface
Modification of Halogenated Amorphous Carbon"
- Karina Ashurbekova (CIC
nanoGUNE BRTA‚ Spain), "Mimicking Chitin and Chitosan Type of
Functionality with Novel Thin Films Grown by Molecular Layer
Deposition"
ALE
2020 Best Student Paper Awardee:
- Nicholas Chittock (Eindhoven
University of Technology, Netherlands), “Isotropic Plasma ALE of Al2O3 Using
SF6 Plasma and TMA”
ALE
2020 Student Finalists:
- Gaëlle Antoun (GREMI
Université d’Orléans/CNRS, France), “Cryo-ALE of SiO2 with
C4F8 Physisorption: Process Understanding and
Enhancement”
- Jessica Murdzek (University
of Colorado – Boulder), “Thermal Atomic Layer Etching of Nickel Using
SO2Cl2and P(CH3)3”
- Xia (Gary) Sang, University of
California Los Angeles, “Thermal-Plasma ALE on Selected Metals for
EUV and Integration Processes”
- David Zywotko (University
of Colorado – Boulder), “Blocking Thermal Atomic Layer Etching with
Removable Etch Stop Layers”
Submit
a Manuscript by October 14 to
the AVS Journal of Vacuum Science & Technology A (JVST A) Atomic
Layer Deposition and Atomic Layer Etching Special Topic Collection. In
addition JVST A awarded the JVST
A 2019 Best ALD Paper Award to:
- Erika Maeda, Toshihide
Nabatame, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda, and
Hajime Kiyono | JVST A 38, 032409 (2020), “Correlation Between SiO2 Growth
Rate and Difference in Electronegativity of Metal–Oxide Underlayers for
Plasma Enhanced Atomic Layer Deposition Using Tris(dimethylamino)silane
Precursor”
Save
the Date
for ALD/ALE 2021 June 27-30, 2021 in Tampa, Florida > www.ald2021.avs.org
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