Save the date - AVS ALD & ALE 2021 June 27-30, 2021, Tampa, Florida

Save the Date June 27-30, 2021, Tampa, Florida

The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida. As in past conferences, the meeting will be preceded (Sunday, June 27) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 28-30) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.

Key Deadlines: Abstract Submission Deadline: February 3, 2021 Author Acceptance Notifications: March 16, 2021 Early Registration Deadline: May 14, 2021 Hotel Reservation Deadline: June 4, 2021 Manuscript Deadline: November 1, 2021

ALD/ALE 2021 Website

ALD Program Chairs   Program Chair: Sean Barry (Carlton University, Canada) Program Co-Chair: Scott Clendenning (Intel, USA)

ALE Program Chairs Program Chair: Jane Chang (University of California, Los Angeles, USA) Program Co-Chair: Thorsten Lill (Lam Research, USA)