Saturday, January 23, 2016

AVS ALE 2016 - Call for Papers, Dublin, July 24-25th

ALE 2016 - Call for Papers!

In conjunction with ALD 2016 in Dublin, Ireland, the AVS Plasma Science and Technology and Thin Film Divisions will be hosting the 3rd workshop on Atomic Layer Etching. 

Deadline: March 18, 2016 : http://ald2016.com/atomic-layer-etching-workshop-overview/



Plenary Speaker

•Ankur Agarwal (Applied Materials)

Invited Speakers
• Steven George, University of Colorado, Boulder
• Dennis van Dorp, IMEC
• Akira Koshiishi, Tokyo Electron
• Kazunori Shinoda, Hitachi Hi-Tech

ALE 2016 Workshop Overview

Extending Moore's law beyond the 10 nm node will increasingly rely on high precision processes employing new materials with high-quality surfaces. Atomic layer etching & atomic layer clean technology is a promising pathway to achieve these fundamental requirements.

In conjunction with ALD 2016 in Dublin, Ireland, the AVS Plasma Science and Technology and Thin Film Divisions will be hosting the 3rd workshop on Atomic Layer Etching. The 2nd ALE workshop was held in 2015, and attracted global participation, with nearly 280 attendees representing both academia and industry. The goals of the meeting are to provide research focus, report progress to-date, and foster collaboration to accelerate this unique capability. Latest findings are expected from experts at major universities, semiconductor manufacturers, and leading equipment suppliers. A broad range of topics are expected, including but not limited to:

• Surface chemical reactions
• Ion energy distributions and control
• Damage-free processes
• Modeling of processes and discharges
• Chemistry synthesis for 'reverse ALD'
• Interesting and new applications for ALE

Workshop Chairs

Bert Ellingboe, Dublin City University (albert.ellingboe@dcu.ie)

Sumit Agarwal, Colorado School of Mines (sagarwal@mines.edu)