Standard: 1 April to 17 June 2016
Late Registration: 18 June to 18 July 2016
Welcome to the 16th Atomic Layer Deposition Conference
The 16th International Conference on Atomic Layer Deposition (ALD 2016)
will be a three-day meeting dedicated to the science and technology of
atomic layer controlled deposition of thin films. In every year since
2001, the conference has been held alternately in United States, Europe
and Asia, allowing fruitful exchange of ideas, know-how and practices
between scientists. This year, the ALD conference will incorporate the
Atomic Layer Etching 2016 Workshop, so that delegates at the two events
can interact freely. The conference will take place on 24-27 July 2016
at the Convention Centre Dublin, Ireland.
Atomic Layer Deposition (ALD) is used to fabricate ultrathin and
conformal thin film structures for many semiconductor and thin film
device applications. A unique attribute of ALD is that it uses
sequential self-limiting surface chemistry to achieve control of film
growth in the monolayer or sub-monolayer thickness regime. ALD is
receiving attention for its applications in leading-edge electronic
technologies, advanced microsystems, displays, energy capture and
storage, solid state lighting, biotechnologies and medical technologies.
Indeed ALD is particularly advantageous for any advanced technology
that requires control of film structure in the nanometer or
sub-nanometer scale.
As in past conferences, the meeting will be preceded by one day of
tutorials. An industry trade show will be held in conjunction with the
conference, to act as common ground for academia and industry to meet
and discuss the future applications of ALD. Extra opportunities for
collaboration will be provided through working groups of the COST Action
‘Hooking together European research in atomic layer deposition (HERALD)’.
This conference offers an excellent opportunity to learn about the
most recent R&D activities in ALD science and technology from
researchers around the world. We look forward to your participation.
ALD 2016 Co-Chairs:
Simon Elliott Tyndall National Institute, Ireland |
Jonas Sundqvist Division of Solid State Physics, Lund University, Sweden |
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