Showing posts with label ALD journal. Show all posts
Showing posts with label ALD journal. Show all posts

Wednesday, November 4, 2020

JVST A | Special Collection Call for Papers on Atomic Layer Deposition and Atomic Layer Etching

The Journal of Vacuum Science and Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition and Atomic Layer Etching. These special topic collections are planned in collaboration with ALD 2020 and the ALE 2020 Workshop, which were held virtually on June 29—July 1, 2020. 

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science and Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. These ALD and ALE Special Topic Collections will include papers presented at ALD 2020 and the ALE 2020 Workshop, as well as other ALD and ALE research articles that were not presented at this conference but are submitted to the special collections. The Collections feature articles dedicated to the science and technology of atomic layer controlled deposition and etching.

Manuscript Deadline: November 18, 2020

Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to tell us that your paper is a part of one of the Collections by choosing either the Special Topic or Conference Collection on “Atomic Layer Deposition (ALD)” or “Atomic Layer Etching (ALE).”


Thursday, September 17, 2020

JVST A | Special Collection: Atomic Layer Deposition and Atomic Layer Etching - Call for Papers

The Journal of Vacuum Science and Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition and Atomic Layer Etching. These special topic collections are planned in collaboration with ALD 2020 and the ALE 2020 Workshop, which were held virtually on June 29—July 1, 2020. Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science and Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. 
 
 

 
 
These ALD and ALE Special Topic Collections will include papers presented at ALD 2020 and the ALE 2020 Workshop, as well as other ALD and ALE research articles that were not presented at this conference but are submitted to the special collections. 
 
The Collections feature articles dedicated to the science and technology of atomic layer controlled deposition and etching. Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to tell us that your paper is a part of one of the Collections by choosing either the Special Topic or Conference Collection on “Atomic Layer Deposition (ALD)” or “Atomic Layer Etching (ALE).”

Thursday, June 13, 2019

Call for papers -Atomic Layer Deposition and Atomic Layer Etching in JVSTA

Manuscript Deadline: November 1, 2019

These 2020 Special Topic Collections are planned in collaboration with ALD 2019 and the ALE 2019 Workshop to be held in Bellevue, WA from July 21—July 24, 2019. The Special Topic Collection will feature sections dedicated to the science and technology of atomic layer controlled deposition and to the science and technology of controlled etching of thin films. While a significant number of articles will be based on material presented at ALD 2019 and the ALE 2019 Workshop, research articles on ALD and ALE but not presented at this conference are also welcome. The special topic collection will be open to all articles on the science and technology of ALD and ALE.

Authors are encouraged to use the JVST template. Online, you will have an opportunity to tell us that your paper is a part of the Special Topic Collection by choosing either the “ALD Special Topic Collection” or the “ALE Special Topic Collection.” See recent Collections: ALD 2019, ALE 2019, ALD 2018, ALE 2018

 
 

Wednesday, October 31, 2018

JVSTA Call for Paper - Atomic Layer Deposition and Atomic Layer Etching

Manuscript Deadline: November 1, 2018

This special topic collection is planned in collaboration with ALD 2018 and the ALE 2018 Workshop to be held in Incheon, South Korea during July 29—August 1, 2018. The Special Topic Collection will feature sections dedicated to the science and technology of atomic layer controlled deposition and to the science and technology of controlled etching of thin films. While a significant number of articles will be based on material presented at ALD 2018 and the ALE 2018 Workshop, research articles on ALD and ALE but not presented at this conference are also welcome. The special topic collection will be open to all articles on the science and technology of ALD and ALE.


 
Authors are encouraged to use the JVST templates. Online, you will have an opportunity to tell us that your paper is a part of the Special Topic Collection by choosing either the “ALD Special Topic Collection” or the “ALE Special Topic Collection.”

Saturday, October 20, 2018

Materials Matters (TM) topical issue on Atomic Layer Deposition

Here is a Materials Matters(TM) topical issue on Atomic Layer Deposition with interesting papers on ALD - especially the one on Group 11 metals. That is ALD of copper, silver and gold by Prof. Barry.

Materials Matters(TM) - Atomic Layer Deposition - Nanomanufacturing with ALD (LINK)
  • NANOCOMPOSITE COATINGS with Tunable Properties Prepared by Atomic Layer Deposition
  • SILICON NITRIDE ATOMIC LAYER DEPOSITION: A Brief Review of Precursor Chemistry
  • GROUP 11 THIN FILMS by Atomic Layer Deposition
  • FEW MONOLAYER ATOMIC LAYER DEPOSITION on Surfaces and Interfaces for Energy Applications


Wednesday, August 29, 2018

JVSTA Call for Research Articles - Atomic Layer Deposition and Atomic Layer Etching

This special topic collection is planned in collaboration with ALD 2018 and the ALE 2018 Workshop to be held in Incheon, South Korea during July 29—August 1, 2018. The Special Topic Collection will feature sections dedicated to the science and technology of atomic layer controlled deposition and to the science and technology of controlled etching of thin films. While a significant number of articles will be based on material presented at ALD 2018 and the ALE 2018 Workshop, research articles on ALD and ALE but not presented at this conference are also welcome. The special topic collection will be open to all articles on the science and technology of ALD and ALE.

Authors are encouraged to use the JVST templates. Online, you will have an opportunity to tell us that your paper is a part of the Special Topic Collection by choosing either the “ALD Special Topic Collection” or the “ALE Special Topic Collection.”
 
 

Monday, August 13, 2018

Virtual Issue: In Honor of Professor Markku Leskelä

This virtual issue celebrates Professor Markku Leskelä (University of Helsinki, Finland) and his decades-long career in the field of Atomic Layer Deposition (ALD). Prof. Leskelä has been the most productive ALD researcher through the history of ALD, and in 2004 he was nominated as an ISI Highly Cited Author in the field of materials science. He directed the Finnish Centre of Excellence in Atomic Layer Deposition (2012-2017) and received the American Vacuum Society ALD Innovation award in 2012.



The papers selected for this virtual issue in honor of Prof. Markku Leskelä are in two sections: one half authored by him and his coworkers, and the other half of the papers were collected by inviting researchers active in ALD chemistry to nominate a paper of their own where they feel they have been influenced by Prof. Leskelä's work. Some of Leskelä's papers are old enough to have gained a great number of citations, some others are very recent that we believe will gain similar attention in the coming years. Besides his ALD publications, a small selection on luminescent materials and organometallic catalysts are included to give some flavor of Prof. Leskelä's research interests and productivity outside ALD. 
 
Virtual Issue: In Honor of Professor Markku Leskelä
Mikko Ritala, Han-Bo-Ram Lee, Jillian Buriak, and Seán T. Barry
Chem. Mater., 2018, 30 (14), pp 4469–4474
DOI: 10.1021/acs.chemmater.8b02742

Wednesday, June 13, 2018

Advanced Materials Special Issue dedicated to current research activities on Materials Science in Finland

This Special Issue is dedicated to current research activities on Materials Science in Finland (LINK), providing a collection of outstanding contributions from diverse research groups on the recent progress regarding silicon and silica nanomaterials, DNA nanotechnology, micro/nano‐motors, biomass‐based nanostructures, nanocellulose, 2D layered materials, atomic layer deposition, superhydrophobic surfaces, and microrobots, from the University of Helsinki, Aalto University, VTT, the University of Turku, Åbo Akademi University, Tampere University of Technology, and the University of Eastern Finland


 Including off course an ALD contribution from Helsinki University!

Atomic Layer Deposition of Rhenium Disulfide


Jani Hämäläinen, Miika Mattinen, Kenichiro Mizohata, Kristoffer Meinander, Marko Vehkamäki, Jyrki Räisänen, Mikko Ritala, Markku Leskelä

First Published: 05 January 2018
 Growth of rhenium disulfide by atomic layer deposition is studied. ReS2 is a 2D material that is not limited to the monolayer thickness because of effective decoupling of the monolayers in bulk. The ReS2 films are deposited from ReCl5 and H2S at up to 500 °C, also on a 3D structure, and the films are characterized.

Thursday, April 26, 2018

JVSTA Call for papers ALD & ALE

Call for Research Articles
Atomic Layer Deposition and Atomic Layer Etching
 
Manuscript Deadline: November 1, 2018
 

 


This special topic collection is planned in collaboration with ALD 2018 and the ALE 2018 Workshop to be held in Incheon, South Korea during July 29—August 1, 2018. The Special Topic Collection will feature sections dedicated to the science and technology of atomic layer controlled deposition and to the science and technology of controlled etching of thin films. While a significant number of articles will be based on material presented at ALD 2018 and the ALE 2018 Workshop, research articles on ALD and ALE but not presented at this conference are also welcome. The special topic collection will be open to all articles on the science and technology of ALD and ALE.


Authors are encouraged to use the JVST templates. Online, you will have an opportunity to tell us that your paper is a part of the Special Topic Collection by choosing either the “ALD Special Topic Collection” or the “ALE Special Topic Collection.

Wednesday, March 14, 2018

Recent metal oxide ALD publications in JVSTA for free download

Here is a list of recent ALD Papers published in JVSTA on the topic of metal oxides. The best of all The following articles are free to download for next 30 days!

Source: JVSTA News Letter



High-k oxides by atomic layer deposition - Applications in biology and medicine
Marek Godlewski, Sylwia Gierałtowska, Łukasz Wachnicki, Rafał Pietuszka, Bartłomiej S. Witkowski, Anna Słońska, Zdzisław Gajewski, and Michał M. Godlewski | Read More

Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
Christie J. Trimble, Trevor Van Engelhoven, Anna M. Zaniewski, Manpuneet K. Benipal, and Robert J. Nemanich | Read More
 
Al2O3/SiOnanolaminate for a gate oxide in a GaN-based MOS device
Daigo Kikuta (菊田大悟 ), Kenji Itoh (伊藤健治 ), Tetsuo Narita (成田哲生 ), and Tomohiko Mori (森朋彦 ) | Read More

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties
Oili M. E. Ylivaara, Lauri Kilpi, Xuwen Liu, Sakari Sintonen, Saima Ali, Mikko Laitinen, Jaakko Julin, Eero Haimi, Timo Sajavaara, Harri Lipsanen, Simo-Pekka Hannula, Helena Ronkainen, and Riikka L. Puurunen | Read More

Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and water
Jere Tupala, Marianna Kemell, Miika Mattinen, Kristoffer Meinander, Sanni Seppälä, Timo Hatanpää, Jyrki Räisänen, Mikko Ritala and Markku Leskelä | Read More

Atomic layer deposition of molybdenum oxide using bis(tert-butylimido)bis(dimethylamido) molybdenum
Adam Bertuch, Ganesh Sundaram, Mark Saly, Daniel Moser, and Ravi Kanjolia | Read More

Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
Kashish Sharma, Dmitri Routkevitch, Natalia Varaksa, and and Steven M. George | Read More

Thursday, February 8, 2018

Recent Solar Cell and Battery Materials Articles in JVSTA

Quite a bunch of interesting ALD papers in JVSTA!


Laser ablation compatible substoichiometric SiOx/SiNy passivating rear side mirror for passivated emitter and rear thin-film crystalline silicon solar cells,  Félix Gérenton, Fabien Mandorlo, Erwann Fourmond, Marine Le Coz, Danièle Blanc-Pélissier, Mustapha Lemiti |  Read More


Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material,  Thomas Dobbelaere, Felix Mattelaer, Philippe M. Vereecken, Christophe Detavernier |  Read More


Performance and durability of broadband antireflection coatings for thin film CdTe solar cells,  G erald Womack, Piotr M. Kaminski, Ali Abbas, Kenan Isbilir, Ralph Gottschalg, John Michael Walls |  Read More

Application of microcracked columnar TiO2 thin films deposited by DC hollow cathode plasma jet in dye-sensitized solar cells,  Roman Perekrestov, Pavel Kudrna, Stanislav Danis, Milan Tichý, Igor Bieloshapka, Rodica Vladoiu |  Read More

Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes,   David H. K. Jackson, Masihhur R. Laskar, Shuyu Fang, Shenzhen Xu, Ryan G. Ellis, Xiaoqing Li, Mark Dreibelbis, Susan E. Babcock, Mahesh K. Mahanthappa, Dane Morgan, Robert J. Hamers, Thomas F. Kuech |  Read More

Single vacuum chamber with multiple close space sublimation sources to fabricate CdTe solar cells,  Drew E. Swanson, Jason M. Kephart, Pavel S. Kobyakov, Kevin Walters, Kevan C. Cameron, Kurt L. Barth, Walajabad S. Sampath, Jennifer Drayton, James R. Sites |  Read More

Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes,   Kashish Sharma, Dmitri Routkevitch, Natalia Varaksa, Steven M. George |  Read More
 
Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries,  Denis V. Nazarov, Maxim Yu. Maximov, Pavel A. Novikov, Anatoly A. Popovich, Aleksey O. Silin, Vladimir M. Smirnov, Natalia P. Bobrysheva, Olga M. Osmolovskaya, and Michail G. Osmolovsky, Aleksandr M. Rumyantsev |  Read More

Atomic layer deposition of NiS and its application as cathode material in dye sensitized solar cell,   Neha Mahuli, Shaibal K. Sarkar |  Read More

Effect of the cadmium chloride treatment on RF sputtered Cd0.6Zn0.4Te films for application in multijunction solar cells,  Tushar M. Shimpi, Jason M. Kephart, Drew E. Swanson, Amit H. Munshi, Walajabad S. Sampath, A. Abbas, John M. Walls |  Read More

Thursday, January 11, 2018

Atomic Level Processing on top in Most Read JVST A Articles in 2017

Atomic Level Processing on top in Most Read JVST A Articles in 2017, including the Virtual Project on the History of ALD (VPHA) recommended reading list. A lot of Etch papers, and many of them from Lam Research.




Review Article: Recommended reading list of early publications on atomic layer deposition — Outcome of the “Virtual Project on the History of ALD”
Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David C. Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis M. Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana Kanervo, Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, A. Outi I. Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Adam A. Łapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Małgorzata Norek, Çağla Özgit-Akgün, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka L. Puurunen, Geert Rampelberg, Robin H. A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry B. Suyatin, Tobias Törndahl, J. Ruud van Ommen, Claudia Wiemer, Oili M. E. Ylivaara, Oksana Yurkevich
JVST A 35, 010801 (2017) | Read More

Predicting synergy in atomic layer etching
Keren J. Kanarik, Samantha Tan, Wenbing Yang, Taeseung Kim, Thorsten Lill, Alexander Kabansky, Eric A. Hudson, Tomihito Ohba, Kazuo Nojiri, Jengyi Yu, Rich Wise, Ivan L. Berry, Yang Pan, Jeffrey Marks, Richard A. Gottscho
JVST A 35, 05C302 (2017) | Read More

Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features
Chad M. Huard, Yiting Zhang, Saravanapriyan Sriraman, Alex Paterson, Mark J. Kushner
JVST A 35, 05C301 (2017) | Read More

Atomic layer etching in close-to-conventional plasma etch tools
Andy Goodyear and Mike Cooke
JVST A 35, 01A105 (2017) | Read More
 
Quasi-atomic layer etching of silicon nitride
Sonam D. Sherpa and Alok Ranjan
JVST A 35, 01A102 (2017) | Read More

Atomic layer etching of SiO 2 by alternating an O 2 plasma with
fluorocarbon film deposition
Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi
JVST A 35, 01A103 (2017) | Read More

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions
Chad M. Huard, Yiting Zhang, Saravanapriyan Sriraman, Alex Paterson, Keren J. Kanarik, Mark J. Kushner
JVST A 35, 031306 (2017) | Read More

Review Article: Reactions of fluorine atoms with silicon, revisited, again
Vincent M. Donnelly
JVST A 35, 05C202 (2017) | Read More

Correcting defects in area selective molecular layer deposition
Richard G. Closser, David S. Bergsman, Luis Ruelas, Fatemeh Sadat Minaye Hashemi, Stacey F. Bent
JVST A 35, 031509 (2017) | Read More

Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator
Yiting Zhang, Chad Huard, Saravanapriyan Sriraman, Jun Belen, Alex Paterson, Mark J. Kushner
JVST A 35, 021303 (2017) | Read More

Monday, October 23, 2017

JVST A Special Issue: Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials

JVST A is Soliciting Research Articles for Publication in a March/April 2018 Special Issue on Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials.

LINK to Jornal : Here
Submission Deadline: November 15, 2017


Malgorzata Kot (Guest Editor) and Justyna Lobaza Image Credit:

This special issue is planned in collaboration with the E-MRS Fall Meeting 2017 to be held at Warsaw University of Technology in Poland, from September 18-21, 2017. The Special Issue will be dedicated to the science and technology of the use of synchrotron radiation to advance the state-of-the-knowledge in atomic layer deposition of materials. While many articles are expected to be based on material presented at the E-MRS Fall Meeting 2017, research articles that are on topic but were not presented at this meeting are also welcome: the special issue will be open to all articles on the science and technology of Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials.

Friday, June 16, 2017

Advanced Materials Special Issue: Materials Platform at Aalto University

Aalto University Reports (LINK):Advanced Electronic Materials, an academic peer-reviewed high-impact materials science journal, has published a special issue dedicated to materials research at Aalto University, in Espoo (near Helsinki), Finland.



Link to special issue: http://onlinelibrary.wiley.com/doi/10.1002/aelm.201770023/full

Some selected papers interestig for the Atomic Layer Community:

Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation - Yameng Bao,* Mikko Laitinen, Timo Sajavaara, and Hele Savin

Band Bending Engineering at Organic/Inorganic Interfaces Using Organic Self-Assembled Monolayers - Oliver T. Hofmann* and Patrick Rinke

Flexible Thermoelectric ZnO-Organic Superlattices on Cotton Textile Substrates by ALD/MLD - Antti J. Karttunen,* Liisa Sarnes, Riikka Townsend, Jussi Mikkonen, and Maarit Karppinen

Enhanced p-Type Transparent Semiconducting Characteristics for ALD-Grown Mg-Substituted CuCrO2 Thin Films - Tripurari S. Tripathi and Maarit Karppinen*



Tuesday, April 25, 2017

JVST A Special Issues | Atomic Layer Deposition & Etching Due Sept. 5

JVST A is Soliciting Research Articles for Publication in a Special January/February 2018 Issue on Atomic Layer Deposition and Atomic Layer Etching


These special issues are planned in collaboration with ALD 2017 Conference and the ALE Workshop being held in Devner, Colorado, July 15-18, 2017 . The Special Issues will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles expected are to be based on material presented at ALD 2017 and the ALE Workshop, research articles that are on ALD and ALE but not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD and ALE. 

Wednesday, May 25, 2016

JVSTA Special issue on ALD & ALE Coming up!


Special Issues

Atomic Layer Deposition - Atomic Layer Etching


JVST A is Soliciting Research Articles for Publication in a Special January/February 2017 Issue on Atomic Layer Deposition and Atomic Layer Etching
Submission Deadline:  September  6, 2016
These special issues are planned in collaboration with  ALD 2016 Conference and the ALE Workshop being held in Dublin, Ireland, during July 24- 27,  2016. The Special Issues will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles expected are to be based on material presented at ALD 2016 and the ALE Workshop, research articles that are on ALD and ALE but not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD and ALE.

Tuesday, April 12, 2016

Recent Advances in Atomic Layer Deposition (ALD)

Recent Advances in Atomic Layer Deposition

Joint collection between Chemistry of Materials, ACS Applied Materials & Interfaces, and ACS Nano

Atomic layer deposition (ALD) is a powerful technique for fabricating atomically precise coatings on a variety of surfaces, with sub-nanometer precision in both film thickness and composition. Because of the self-limiting surface chemistry intrinsic to the ALD process, one can also conformally coat ultrahigh aspect ratio surfaces, including nanoporous solids and three-dimensional (3D) hierarchical structures. This degree of synthetic control makes it an ideal platform for performing fundamental investigations of nanoscale materials, as well as fabrication of complex functional coatings for a wide range of applications. Essentially, whenever surface and/or interfacial phenomena dominate application properties at the nanoscale, ALD represents one of the most powerful approaches for both fundamental and applied research. In this ACS Select Virtual Issue, 31 recent publications are highlighted from Chemistry of Materials, ACS Applied Materials & Interfaces, and ACS Nano, chosen to demonstrate the breadth and depth of emerging ALD research. Particular emphasis was placed on the novelty and impact in the research, to provide the reader with a sense of the state-of-the art in ALD research, and perspectives on future directions. 

-From the editorial by Neil P. Dasgupta, Han-Bo-Ram Lee, Stacey F. Bent, and Paul S. Weiss
DOI: 10.1021/acs.chemmater.6b00673

New Book: Growth and Transport in Nanostructured Materials by Angel Yangas-Gil

Here is a new book on the fundamentals of PVD, CVD and ALD by Angel Yangas-Gil who is a Principal Materials Scientist & Institute Fellow, Northwestern Argonne Institute of Science and Engineering and well known Expert in the ALD community.

Angel Yangas-Gil is a Principal Materials Scientist & Institute Fellow, Northwestern Argonne Institute of Science and Engineering (link)

Growth and Transport in Nanostructured Materials

The Fundamentals of PVD, CVD and ALD

 Yanguas-Gil, Angel

This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis.

 The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.

Friday, March 25, 2016

Recent Publications on ALD and ALE from JVST A and JVST B


JVST Publishes Fundamental and Applied Research Articles and Letters on Atomic Layer Deposition and Etching


Recent Publications on ALD and ALE from JVST A and JVST B

Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO2 films
Silma Alberton Corrêa, Simone Brizzi and Dieter Schmeisser
J. Vac. Sci. Technol. A 34, 01A117 (2016) | Read More

Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
J Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler and Fritz B. Prinz
J. Vac. Sci. Technol. A 34, 01A138 (2016) | Read More

Standing and sitting adlayers in atomic layer deposition of ZnO
Zhengning Gao, Fei Wu, Yoon Myung, Ruixiang Fei, Ravindra Kanjolia, Li Yang and Parag Banerjee
J. Vac. Sci. Technol. A 34, 01A143 (2016) | Read More

Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
Inhye Lee, Jingyu Park, Heeyoung Jeon, Hyunjung Kim, Changhee Shin, Seokyoon Shin, Kunyoung Lee and Hyeongtag Jeon
J. Vac. Sci. Technol. A 34, 031502 (2016) | Read More

Growth per cycle of alumina atomic layer deposition on nano- and micro-powders
Kedar Manandhar, James A. Wollmershauser, Janice E. Boercker and Boris N. Feigelson
J. Vac. Sci. Technol. A 34, 021519 (2016) | Read More

Growth, intermixing, and surface phase formation for zinc tin oxide nanolaminates produced by atomic layer deposition
Carl Hägglund, Thomas Grehl, Jukka T. Tanskanen, Ye Sheng Yee, Marja N. Mullings, Adriaan J. M. Mackus, Callisto MacIsaac, Bruce M. Clemens, Hidde H. Brongersma and Stacey F. Bent
J. Vac. Sci. Technol. A 34, 021516 (2016) | Read More

Atomic layer deposition of two dimensional MoS2 on 150 mm substrates
Arturo Valdivia, Douglas J. Tweet and John F. Conley Jr.
J. Vac. Sci. Technol. A 34, 021515 (2016) | Read More

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Tplasma sources
Ashish V. Jagtiani, Hiroyuki Miyazoe, Josephine Chang, Damon B. Farmer, Michael Engel, Deborah Neumayer, Shu-Jen Han, Sebastian U. Engelmann, David R. Boris, Sandra C. Hernández, Evgeniya H. Lock, Scott G. Walton and Eric A. Joseph
J. Vac. Sci. Technol. A 34, 01B103 (2016) | Read More

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4Fand Ar/CHF3 plasma
Dominik Metzler, Chen Li, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph and Gottlieb S. Oehrlein
J. Vac. Sci. Technol. A 34, 01B101 (2016) | Read More

At the edge between metal organic chemical vapor deposition and atomic layer deposition: Fast Atomic Sequential Technique, for high throughput conformal deposition
Fabien Piallat and Julien Vitiello
J. Vac. Sci. Technol. B 34, 021202 (2016) | Read More

Saturday, January 23, 2016

Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!

Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!



 
Journal of Vacuum Science & Technology A - 
First 2016 Issue Online Special Issue on ALD/ALE
2.322 
Impact Factor