Recent Advances in Atomic Layer Deposition
Joint collection between Chemistry of Materials, ACS Applied Materials & Interfaces, and ACS Nano
Atomic layer deposition (ALD) is a powerful technique for
fabricating atomically precise coatings on a variety of surfaces, with
sub-nanometer precision in both film thickness and composition. Because
of the self-limiting surface chemistry intrinsic to the ALD process, one
can also conformally coat ultrahigh aspect ratio surfaces, including
nanoporous solids and three-dimensional (3D) hierarchical structures.
This degree of synthetic control makes it an ideal platform for
performing fundamental investigations of nanoscale materials, as well as
fabrication of complex functional coatings for a wide range of
applications. Essentially, whenever surface and/or interfacial phenomena
dominate application properties at the nanoscale, ALD represents one of
the most powerful approaches for both fundamental and applied research.
In this ACS Select Virtual Issue, 31 recent publications are highlighted
from Chemistry of Materials, ACS Applied Materials & Interfaces, and ACS Nano,
chosen to demonstrate the breadth and depth of emerging ALD research.
Particular emphasis was placed on the novelty and impact in the
research, to provide the reader with a sense of the state-of-the art in
ALD research, and perspectives on future directions.
-From the editorial by Neil P. Dasgupta, Han-Bo-Ram Lee, Stacey F. Bent, and Paul S. Weiss
DOI: 10.1021/acs.chemmater.6b00673
DOI: 10.1021/acs.chemmater.6b00673
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