UPDATE! Tutorials on Atomic-Layer-Processing – Sunday 24th July ALD2016 Dublin

Tutorial on Atomic-Layer-Processing – Sunday 24th July

Time	Speaker	Organisation	Title
13:00	Fred Roozeboom	TU Eindhoven, The Netherlands	Processing for 3D-IC Technologies
13:30	Annelies Delabie	IMEC, Belgium	Atomic layer processing of 2D materials for beyond CMOS applications
14:00	Break
14:15	Sumit Agarwal	Colorado School of Mines	USA Plasma Physics and Diagnostics
14:45	Stephan Wege	Plasway GmbH, Germany	Plasma Processing Reactor Design
15:15	Keren Kanarik	Lam Research, USA	Overview of Atomic Layer Etching
15:45	Break
16:00	Sean Barry	Carleton University, Canada	ALD Precursor Design & Synthesis
16:30	Massimo Tallarida	Alba, Spain	Characterization of ALD processes and Materials using Synchrotron Light
17:00	Coaches to Guinness Storehouse for Welcome Reception