Conference Timings:
Sunday 24 July:Tutorial runs 13:00-17:00 in Convention Centre. Welcome reception that evening in Guinness Storehouse.
Monday 25 July – Wednesday 27 July:
ALD2016 Conference will open at 8:15 in Convention Centre and closes at 17:45 on Wednesday 27 July followed by a gala dinner on Wednesday evening.
Conference Programme:
Tutorial on Atomic-Layer-Processing, Sunday 24th July:
Click on the speaker name to view their profile:Speaker | Organisation | Presentation Title |
Sumit Agarwal | Colorado School of Mines | USA Plasma Physics and Diagnostics |
Keren Kanarik | Lam Research, USA | Overview of Atomic Layer Etching |
Fred Roozeboom | TU Eindhoven, The Netherlands | Processing for 3D-IC Technologies |
Sean Barry | Carleton University, Canada | ALD Precursor Design & Synthesis |
Massimo Tallarida | Alba, Spain, | Characterization of ALD processes and Materials using Synchrotron Light |
Annelies Delabie | IMEC, Belgium | Atomic layer processing of 2D materials for beyond CMOS applications |
Stephan Wege | Plasway GmbH, Germany | Plasma Processing Reactor Design |
Invited speakers:
Speaker | Organisation | Presentation title |
Raymond Adomaitis | University of Maryland | Reaction Network Analysis for ALD Processes |
Robert Clark | TEL America | |
Byung Joon Choi | Seoul National University of Science and Technology | Multi-layered selector and switch devices enabled by atomic layer deposition for crosspoint memory |
Mike Cooke | Oxford Instruments | |
Jolien Dendooven | University of Ghent | Synchrotron-based characterization of Pt ALD |
Michael Gros-Jean | STMicroelectronics | |
Joseph Hupp | Northwestern University | |
Ying-Bing Jiang | University of New Mexico / Angstrom Thin Film Technologies LLC, USA | |
John Langan | Air Products | |
Anatollii Malygin | St Petersburg State Technological Institute | |
Yongfeng Mei | Fudan University | |
Lars Samuelson | Lund University | Nanowire-based Technologies for Electronics, LEDs and Solar-cells |
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