Thursday, April 21, 2016

High - K & Metal Precursors for ICs to Reach ~$400M by 2020

The Techcet ALD/CVD  High K & Metal Precursors report provides information on the applications and markets associated with front end and back end of line precursors used to produce high dielectric constant (K) dielectrics and atomic layer deposition metal oxides and nitrides.
 
 
 
Each report order includes an advisory service. Click to learn more.