Advanced Materials Special Issue dedicated to current research activities on Materials Science in Finland

This Special Issue is dedicated to current research activities on Materials Science in Finland (LINK), providing a collection of outstanding contributions from diverse research groups on the recent progress regarding silicon and silica nanomaterials, DNA nanotechnology, micro/nano‐motors, biomass‐based nanostructures, nanocellulose, 2D layered materials, atomic layer deposition, superhydrophobic surfaces, and microrobots, from the University of Helsinki, Aalto University, VTT, the University of Turku, Åbo Akademi University, Tampere University of Technology, and the University of Eastern Finland

 Including off course an ALD contribution from Helsinki University!

Atomic Layer Deposition of Rhenium Disulfide

Jani Hämäläinen, Miika Mattinen, Kenichiro Mizohata, Kristoffer Meinander, Marko Vehkamäki, Jyrki Räisänen, Mikko Ritala, Markku Leskelä

First Published: 05 January 2018

 Growth of rhenium disulfide by atomic layer deposition is studied. ReS2 is a 2D material that is not limited to the monolayer thickness because of effective decoupling of the monolayers in bulk. The ReS2 films are deposited from ReCl5 and H2S at up to 500 °C, also on a 3D structure, and the films are characterized.