Tutorial Plasma assisted atomic level processing – PEALD & ALE at PSE2018

Plasma assisted atomic level processing – PEALD & ALE , Sunday, September 16, 2018

The focus will be on atomic level processing technologies, such as Plasma Enhanced Atomic Layer Deposition (PEALD) and Atomic Layer Etching (ALE). The tutorial will provide the basics of the processes, but also insights into the fundamentals of processes, as well as an overview of the processing equipment and applications of these leading edge technologies.

The tutorial will be organized by Adriana Creatore, TU Eindhoven, the Netherlands, in cooperation with Jonas Sundqvist, Fraunhofer IKTS, Dresden, Germany.

9:00 - 9:30	Introduction Adriana Creatore, Eindhoven University of Technology, the Netherlands Jonas Sundqvist, Fraunhofer Institute for Ceramic Technologies and Systems IKTS, Germany
9:30 - 11:00	“Overview of thin film deposition and nanofabrication by atomic layer deposition” Adrie Mackus, Department of Applied Physics, Eindhoven University of Technology, the Netherlands
11:00 - 11:30	Break
11:30 - 13:00	“Plasma atomic layer deposition: basics, mechanisms and applications” Harm Knoops, Oxford Instruments Plasma Technology, United Kingdom and Department of Applied Physics, Eindhoven University of Technology, the Netherlands
13:00 - 14:00	Lunch
14:00 - 15:30	“Principles, basics and practical examples of Plasma Atomic Layer Etching” Sabbir Khan, Department of Physics, Lund University, Sweden
15:30 - 16:00	Break
16:00 - 17:30	“Plasma-ALD and ALE processes in high volume manufacturing and emerging applications” Jonas Sundqvist, Fraunhofer Institute for Ceramic Technologies and Systems IKTS, Germany
17:30	End of the tutorial