Recent Publications on ALD and ALE from JVST A and JVST B

JVST Publishes Fundamental and Applied Research Articles and Letters on Atomic Layer Deposition and Etching

Recent Publications on ALD and ALE from JVST A and JVST B

Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO₂ films

Silma Alberton Corrêa, Simone Brizzi and Dieter Schmeisser

J. Vac. Sci. Technol. A 34, 01A117 (2016) | Read More

Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

J Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler and Fritz B. Prinz

J. Vac. Sci. Technol. A 34, 01A138 (2016) | Read More

Standing and sitting adlayers in atomic layer deposition of ZnO

Zhengning Gao, Fei Wu, Yoon Myung, Ruixiang Fei, Ravindra Kanjolia, Li Yang and Parag Banerjee

J. Vac. Sci. Technol. A 34, 01A143 (2016) | Read More

Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition

Inhye Lee, Jingyu Park, Heeyoung Jeon, Hyunjung Kim, Changhee Shin, Seokyoon Shin, Kunyoung Lee and Hyeongtag Jeon

J. Vac. Sci. Technol. A 34, 031502 (2016) | Read More

Growth per cycle of alumina atomic layer deposition on nano- and micro-powders

Kedar Manandhar, James A. Wollmershauser, Janice E. Boercker and Boris N. Feigelson

J. Vac. Sci. Technol. A 34, 021519 (2016) | Read More

Growth, intermixing, and surface phase formation for zinc tin oxide nanolaminates produced by atomic layer deposition

Carl Hägglund, Thomas Grehl, Jukka T. Tanskanen, Ye Sheng Yee, Marja N. Mullings, Adriaan J. M. Mackus, Callisto MacIsaac, Bruce M. Clemens, Hidde H. Brongersma and Stacey F. Bent

J. Vac. Sci. Technol. A 34, 021516 (2016) | Read More

Atomic layer deposition of two dimensional MoS₂ on 150 mm substrates

Arturo Valdivia, Douglas J. Tweet and John F. Conley Jr.

J. Vac. Sci. Technol. A 34, 021515 (2016) | Read More

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T_e plasma sources

Ashish V. Jagtiani, Hiroyuki Miyazoe, Josephine Chang, Damon B. Farmer, Michael Engel, Deborah Neumayer, Shu-Jen Han, Sebastian U. Engelmann, David R. Boris, Sandra C. Hernández, Evgeniya H. Lock, Scott G. Walton and Eric A. Joseph

J. Vac. Sci. Technol. A 34, 01B103 (2016) | Read More

Fluorocarbon assisted atomic layer etching of SiO₂ and Si using cyclic Ar/C₄F₈ and Ar/CHF₃ plasma

Dominik Metzler, Chen Li, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph and Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 34, 01B101 (2016) | Read More

At the edge between metal organic chemical vapor deposition and atomic layer deposition: Fast Atomic Sequential Technique, for high throughput conformal deposition

Fabien Piallat and Julien Vitiello

J. Vac. Sci. Technol. B 34, 021202 (2016) | Read More