The first speakers for ALD 2016 in Dublin are announced!

Speakers and Conference Programme

Conference Speakers:

We are delighted to announce the first speakers for ALD 2016:
Please click on the bold speaker names to view their profile.

Speaker	Organisation	Presentation title
Raymond Adomaitis	University of Maryland
Sumit Agarwal	Colorado School of Mines, USA	Plasma Physics and Diagnostics
Seán Barry	Carleton University, Canada	ALD Precursor Design & Synthesis
Robert Clark	TEL America
Byung Joon Choi	Seoul National University of Science and Technology	Multi-layered selector and switch devices enabled by atomic layer deposition for crosspoint memory
Mike Cooke	Oxford Instruments
Annelies Delabie	IMEC	Atomic layer processing of 2D materials for beyond CMOS applications
Jolien Dendooven	University of Ghent	Synchrotron-based characterization of Pt ALD
Mickael Gross-Jean	ST Microelectronics
Joseph Hupp	Northwestern University
Ying-Bing, Jiang	University of New Mexico
Keren Kanarik	Lam Research, USA	Overview of Atomic Layer Etching
John Langan	Air Products
Anatollii Malygin	St Petersburg State Technological Institute
Yongfeng Mei	Fudan University
Fred Roozeboom	TU Eindhoven, The Netherlands	Processing for 3D-IC Technologies
Lars Samuelson	Lund University	Nanowire-based Technologies for Electronics, LEDs and Solar-cells
Massimo Tallarida	ALBA Synchrotron, Spain	Characterization of ALD processes and Materials using Synchrotron Light
Stephan Wege	Plasway GmbH, Germany	Plasma Processing Reactor Design

Further speakers, profiles and the conference programme will be published soon.  Please check back for information.