New System Integrates Core Pulsar® and EmerALD® Capabilities with Higher Productivity, Enabled by Multi-Chamber 300mm XP8 Platform
SAN FRANCISCO, California - ASM International N.V. (Euronext Amsterdam: ASM) today announced the Synergis®atomic layer deposition (ALD) tool for advanced-node logic and memory high-volume production applications. The latest addition to ASM's industry-leading line of ALD tools, Synergis leverages ASM's core ALD hardware and process technology, optimized over more than a decade in volume manufacturing, to address a wide range of thermal ALD applications.
Demand for ALD solutions is growing, as it enables the use of new materials and designs for advanced chip manufacturing. The new Synergis system is designed to address a number of key ALD equipment challenges, by providing superior thermal control of the reactor environment, delivery of low-vapor-pressure precursors, purge efficiency and reduced preventive-maintenance cycles. As a result, Synergis delivers excellent conformality and film uniformity with high throughput and low per-wafer cost.