Wednesday, July 22, 2015

Institute of Solid State Physics at the Bulgarian Academy of Sciences installs ALD and PECVD

The European Seventh Framework Program has funded purchase and installation of several advanced process tool at the Institute of Solid State Physics at the Bulgarian Academy of Sciences. 
  • Beneq TFS 200 Atomic layer Deposition
  • PECVD Oxford Nanofab Plasmalab System 100
INERA Open Days will take place at the Institute of Solid State Physics (BAS) during October 16 – 17, 2015.

The planed event will be designed to ensure that the visitors get detailed information about the project and its progress. They will have the opportunity to visit laboratories, listen to presentations on scientific novelties in different research fields of nanotechnology and its applications and discuss current topics with scientists from the Institute and its Partners within the project.

For more information on the equipment purchased within the framework of the European project INERA click here:

The newly purchased within the framework of the European project INERA, Beneq TFS 200 (above) is a flexible ALD platform designed for research and development. Direct thermal and plasma ALD operation and remote plasma-enhanced deposition (PEALD) are available in the TFS 200 as a standard option. The plasma is capacitively-coupled (CCP), which is the industry standard nowadays. The TFS 200 is capable of coating planar objects and complex 3D shapes with very high aspect ratio features. TFS 200 has unique precursor capabilities of temperature rating up to 400. A total of 6 different gas lines, 4 liquid sources and 3 hot sources fulflil the most demanding requirements.

Available precursors are: DEZ (Diethyl zinc), TMA (Trimethyl aluminum), BTBAS ((Bis(tertiary-butyl- amino)silane)), Ferrocene (bis(η5-cyclopentadienyl)iron), Cobaltocene (Bis(η5-cyclopentadienyl)cobalt), Nickelocene ((Bis(cyclopentadienyl) nickel(II)).

Preliminary tests of pristine and doped ZnO thin films on deposition Al2O3 were successfully performed.
The PECVD system of Oxford Instruments (above)“Nanofab Plasmalab System 100” is a modern multi-purpose tool for various CVD and PECVD processes. The system has a vacuum loadlock and is designed for 2” – 8” wafer or other substrates. The maximal temperature of the substrate holder is 1200 °C which is suitable for deposition of graphene. Both radio-frequency (MHz) and low-frequency (kHz) plasma can be generated in the reaction chamber. The system is equipped with 6 gas lines which allows a variety of chemical processes. In the framework of the project INERA the tool will be used for growth of graphene and carbon nanotubes. 

These modern equipments are installed in a clean room class 10 000 with an area of about 40 m2 (above).

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