Wednesday, July 15, 2015

16th International Conference on Atomic Layer Deposition, 24th-27th July 2016, Dublin

The 16th International Conference on Atomic Layer Deposition (ALD 2016) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. In every year since 2001 at Monterey, the conference has been held alternately in United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place on 24-27 July 2016 at the Convention Centre Dublin, Ireland.

Atomic Layer Deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface chemistry to achieve control of film growth in the monolayer or sub-monolayer thickness regime. ALD is receiving attention for its applications in leading-edge electronic technologies, advanced microsystems, displays, energy capture and storage, solid state lighting, biotechnologies and medical technologies. Indeed ALD is particularly advantageous for any advanced technology that requires control of film structure in the nanometer or sub-nanometer scale.

As in past conferences, the meeting will be preceded by one day of tutorials. An industry trade show will be held in conjunction with the conference, to act as common ground for academia and industry to meet and discuss the future applications of ALD. Extra opportunities for collaboration will be provided through working groups of the COST Action ‘Hooking together European research in atomic layer deposition (HERALD)’.

The presentations will be recorded and electronic copies of the presentations (including oral component, questions/answers and posters) will be made available in the form of copy-secured DVDs.

This conference offers an excellent opportunity to learn about the most recent R&D activities in ALD science and technology from researchers around the world. We look forward to your participation.

ALD 2016 Co-Chairs:

Simon Elliott, Tyndall National Institute , IrelandJonas Sundqvist, Division of Solid State Physics, Lund University, Sweden
Simon Elliott
Tyndall National Institute,
Jonas Sundqvist
Division of Solid State Physics,
Lund University, Sweden

Key Dates

Registration opens: Friday, 1st January 2016.
Early bird registration closes: Thursday, 31 March 2016.
Abstract submission opens: Monday, 30th November 2015.
Abstract submission closes: Sunday, 14th February 2015.
Author notification: Sunday, 21st May 2016.
Conference opens: Sunday, 24th July 2016.
Conference concludes: Wednesday, 27th July 2016.

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