Thursday, July 23, 2015

The 37th Int Symposium on Dry Process (DPS2015) in Japan November 5 & 6

The 37th International Symposium on Dry Process (DPS2015) will be held at Awaji Yumebutai International Conference Center, Awaji Island, in Japan, on November 5 & 6, 2015. This year there are a number of interesting talks by invited speakers on Atomic Layer Etching (ALE) form TU Eindhoven, Lam Research, Applied Materials. (Thanks Sabbir Khan for sharing)

The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

Invited speakers and tentative titles(Tentative)

  • Dr. Sebastian Engelmann (IBM Thomas J. Watson Research Ctr.)
    "Improving high aspect ratio processes for logic applications through gas chemistry and plasma discharge optimization"
  • Prof. Erwin Kessels (The Eindhoven University of Technology)
    "Atomic layer deposition and etching: progress and prospects"
  • Dr. Chris Lee (Lam Research Corporation)
    "Challenges of Atomic-layer processing: an industry perspective"
  • Dr. Hirokazu Ueda (Tokyo Electron Ltd. )
    "Conformal doping using a radial line slot antenna microwave plasma source"
  • Dr. Peter Ventzek (Tokyo Electron America, Inc.)
  • Dr. Ying Zhang (Applied Materials Inc.)
    "A New Frontier of Plasma Patterning: Atomic Layer Etch"

No comments:

Post a Comment