Tuesday, July 12, 2022
Supply chain limited by Russia / US CHIPS Act a game changer
Monday, July 11, 2022
AlixLabs at AVS ALD ALE 2022 in Ghent, Belgium
AlixLabs AB participated and presented at The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) in Ghent, Belgium June 27 to 29.
Yoana gave her oral presentation in session LE1-TuA-4 In-situ Optical Emission Spectroscopy as a Tool to Characterize Cyclic Quasi-Atomic Layer Etching, Yoana Ilarionova, Lund University, Sweden; M. Karimi, AlixLabs, Sweden; D. Lishan, D. Geerpuram, Plasma-Therm LLC, USA; R. Jafari Jam, D. Suyatin, J. Sundqvist, AlixLabs, Sweden; I. Maximov, Lund University, Sweden
Jonas gave an invited talk for TECHCET LLC CA in: AA2-TuM2-1 High ALD Equipment and Precursor Demand and 5-Year Forecast Due to Continued Semiconductor Device Scaling and Fab Expansions.
Dmitry as part of the AVS ALE Scientific Committee moderated the session ALE1-TuA In situ Studies, Mechanisms, and Modeling of ALE. We had a fantastic time and met a lot of old friends and made new ones!
Boat trip in beautiful Ghent
AVS ALD ALE 2022 Page: ald2022.avs.org/
New world records: perovskite-on-silicon-tandem solar cells
EPFL and CSEM smash through the 30% efficiency barrier for perovskite-on-silicon-tandem solar cells —setting two certified world records
Thursday, June 30, 2022
Back to Basics: Understanding Conformality with Riikka Puurunen – ALD Stories Ep. 14
PillarHall – introduction in SlideShare
PillarHall – introduction in YouTube
PillarHall – short introduction in YouTube
Video: How to use PillarHall test chip
PillarHall Web Site
Monday, June 27, 2022
ALD/CVD Precursor Markets – Burgeoning Applications
Advanced Logic and Memory Applications require more deposition materials.
Friday, June 24, 2022
Hydrogen Peroxide Gas on the road from R&D to HVM for superior HZO films
Thursday, June 23, 2022
TANAKA Establishes New Ruthenium Film Deposition Process That Contributes Toward Improved Durability Of Semiconductors
How Forge Nano is Engineering the Future, One Atom at a Time
Utilizing proprietary nano-coating technology, Forge Nano is able to fundamentally improve nearly any material on earth at the atomic level.
Wednesday, June 22, 2022
Solar Energy Research Institute of Singapore (SERIS) Opts for SALD
NCD supplied ALE and ASD equipment to Samsung Electronics Co., Ltd.
<Lucida M200PL Series ALD System>
Thursday, June 16, 2022
Applied Materials Broadens its Technology Portfolio for Specialty Chips with Acquisition of Picosun
Electronic Gases Markets – To Approach a US$9 Billion Market in 2022
Friday, June 10, 2022
Atomic Layer Deposition Expected to Grow to Meet Demand for More-than-Moore Devices and Applications
Thursday, May 12, 2022
Picosun solution enables stretchable organic electronics manufacturing on large scale
Tuesday, May 10, 2022
Semiconductor Materials at a Critical Tipping Point - Key Industry Issues Revealed
Monday, May 2, 2022
NCD supplied additional ALD equipment for special protective coating
Friday, April 8, 2022
Sneak Peak Into Our New Equipment Components Session at CMC2022 in Chandler AZ April 27-29
ALD of almost pure organic polymer (3-4 at% Al) films with stability up to 400 °C
Thursday, April 7, 2022
Spatial ALD Day coming up at TU Eindhoven June 9
Save the date! On June 9th 2022, we will organize a spatial ALD day at the Eindhoven University of Technology.
— AtomicLimits (@AtomicLimits) April 6, 2022
You can preregister on the website! The final registration form will appear early May when the detailed program is known.https://t.co/GjjpkGRdDX#ALDep #ALD pic.twitter.com/Bt5jJYg111