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Back for her second episode, Professor Riikka Puurunen is bringing us back to the basics with a deep dive on conformality. Recorded live from the Harald Herlin Learning Center at Aalto University, Tyler and Riikka talk about the all-important property of ALD. In this episode, Riikka explains the history of conformality in ALD, her recent paper on modeling collaboration, the origins of the PillarHall conformality test structures, and a conversation on open science.
One question came up, when was ALD first used for high aspect-ratio DRAM capacitors? It was 2004 by Samsung Samsung begins making DRAMs on 90-nm process - EETimes
Chipmetrics has commercialized the PillarHall test chip and more information can be found here: Chipmetrics
PillarHall – introduction in SlideShare
PillarHall – introduction in YouTube
PillarHall – short introduction in YouTube
Video: How to use PillarHall test chip
PillarHall Web Site
PillarHall – introduction in SlideShare
PillarHall – introduction in YouTube
PillarHall – short introduction in YouTube
Video: How to use PillarHall test chip
PillarHall Web Site
Chipmetrics at ALD 2022 in Ghent.
This video has been incredibly helpful for my assignment. The deep dive into conformality in ALD, along with insights into its history and applications such as high aspect-ratio DRAM capacitors, has provided much-needed assistance to do my assignment. Riikka Puurunen's explanations were particularly insightful and have greatly enhanced my understanding of the topic. I'm grateful for the comprehensive coverage of this subject.
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