AlixLabs AB participated and presented at The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) in Ghent, Belgium June 27 to 29.
Yoana gave her oral presentation in session LE1-TuA-4 In-situ Optical Emission Spectroscopy as a Tool to Characterize Cyclic Quasi-Atomic Layer Etching, Yoana Ilarionova, Lund University, Sweden; M. Karimi, AlixLabs, Sweden; D. Lishan, D. Geerpuram, Plasma-Therm LLC, USA; R. Jafari Jam, D. Suyatin, J. Sundqvist, AlixLabs, Sweden; I. Maximov, Lund University, Sweden
Jonas gave an invited talk for TECHCET LLC CA in: AA2-TuM2-1 High ALD Equipment and Precursor Demand and 5-Year Forecast Due to Continued Semiconductor Device Scaling and Fab Expansions.
Dmitry as part of the AVS ALE Scientific Committee moderated the session ALE1-TuA In situ Studies, Mechanisms, and Modeling of ALE. We had a fantastic time and met a lot of old friends and made new ones!
Boat trip in beautiful Ghent
AVS ALD ALE 2022 Page: ald2022.avs.org/
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