Tuesday, October 6, 2015

Photoshow : ALD Lab Dresden Symposium at SEMICON Europa 2015

SEMICON Europa this year has turned out to be a major event for ALD and exciting nanoelectronic materials research. Here are photos taken from The ALD Day October 6th, 2015!

More details on this event you can find here : http://baldengineering.blogspot.de/2015/10/ald-ale-and-exciting-nanoelectronic.html

We are already looking forward to SEMICON Europa 2016 in Grenoble, France and to co-chair an ALD Sympoium there yet one more time!

SEMICON Europa ALD 2014, Grenoble : http://baldengineering.blogspot.de/2014/10/voila-3rd-ald-lab-dresden-symposium-at.html

Columbus, Tuesday Oct 6, 13:45, ALD / ALE Sympoium of The ALD Lab Dresden, Messe Dreaden, Germany

Waiting for the ALD Storm!

Prof. Johann W. Bartha, TU Dresden

In situ monitoring of Atomic Layer Deposition in porous materials
Martin Knaut, TU Dresden

Passivation of MEMS by Atomic Layer Deposition
Matthias Schwille, Robert Bosch

Symposium is full - please help me throw out a PVD guy

Growth Monitoring by XPS and LEIS Investigations of Ultrathin Copper Films Deposited by Atomic Layer Deposition
Dileep Dhakal, TU Chemnitz/FhG ENAS

High-k dielectrics by ALD for BEOL compatible MIM
Wenke Weinreich, FhG IPMS-CNT

ALD coatings for applications as permeation barrier and protective layer in fiber-reinforced materials
Mario Krug, FhG IKTS

ALD for solar cell application
Ingo Dirnstorfer, NaMLab

Plasma enhanced ALD process for TiO2- and WO3- films
Alexander Strobel, FH Zwickau

Why do we need Atomic Layer Etching
Jonas Sundqvist, Lund University/TU Dresden

Spatial Atomic Layer Deposition and Atomic Layer Etching
Prof. Fred Roozeboom, TU Eindhoven / TNO Eindhoven

Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?
Harm Knoops, Oxford Instruments/TU Eindhoven

Hardmask and side wall protection during dry etching with plasma enhanced deposition during dry etching for ALE purposes
Stephan Wege, Plasway

Industrial High Throughput Atomic Layer Deposition Equipment and Process for OLED Encapsulation
Jacques Kools, Encapsulix

Monolayer controlled deposition of 2D transition metal dichalcogenides on large area substrates
Annelies Delabie, Imec

Selective Deposition as Enabler for Shrinking Device Dimensions

Suvi Haukka, Executive Scientist, ASM Microchemistry Ltd.

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