Sunday, October 25, 2015

Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition

Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition

Fatemeh Sadat Minaye Hashemi, Chaiya Prasittichai, and Stacey F. Bent

ACS Nano, 2015, 9 (9), pp 8710–8717


Author Fatemah Hashemi discusses their new atomic layer deposition (ALD) approach, which combines selective etching with selective depositon. Read the related ACS Nano article at http://pubs.acs.org/doi/abs/10.1021/a...


Nanoscale patterning of materials is widely used in a variety of device applications. Area selective atomic layer deposition (ALD) has shown promise for deposition of patterned structures with subnanometer thickness control. However, the current process is limited in its ability to achieve good selectivity for thicker films formed at higher number of ALD cycles. In this report, we demonstrate a strategy for achieving selective film deposition via a self-correcting process on patterned Cu/SiO2 substrates. We employ the intrinsically selective adsorption of octadecylphosphonic acid self-assembled monolayers on Cu over SiO2 surfaces to selectively create a resist layer only on Cu. ALD is then performed on the patterns to deposit a dielectric film. A mild etchant is subsequently used to selectively remove any residual dielectric film deposited on the Cu surface while leaving the dielectric film on SiO2 unaffected. The selectivity achieved after this treatment, measured by compositional analysis, is found to be 10 times greater than for conventional area selective ALD.