Monday, October 26, 2015

Atomic Layer Deposition (ALD) in Energy, Environment, and Sustainability

Atomic Layer Deposition (ALD) in Energy, Environment, and Sustainability

Figure
Figure. Schematic diagram of an ideal surface coating layer on active materials. Image provided by Xueliang Sun.

Guest Editors

Hongjin FanNanyang Technological University, Singapore
Yongfeng MeiFudan University, China
Mato KnezCIC nanoGUNE Research Center, Spain

Scope

The essential characteristics of an atomic layer deposition (ALD) reaction are the sequential self-limiting surface reactions to achieve conformal thin films with sub-monolayer thickness control. This advantage over other deposition processes renders a wide range of applications. While ALD was conventionally applied mainly in semiconductor electronic industry, recently, it is receiving increasing attention for wider applications in energy, environment, and sustainability research, with the advance in recipe development.
This focus collection will centre on the increasing importance of ALD techniques in developing innovative nanoscale materials, processes, devices, and systems relating to energy and environmental applications. Original and Review work detailing the development of energy nanomaterials and devices, including photovoltaics, batteries and supercapacitors, fuel cells, photocatalysts, and photoelectrochemical cells are solicited. Additionally developments in nanophotonics, including applications of ALD in new plasmonics, nanoscale laser, and metamaterials research are included. Interest of this collection also extends to innovations in chemical and biosensing using ALD, for example, organic pollution degradation, surface plasmon sensors, and quantum dot biomarkers.
The scope of this collection includes:
  • Fabrication and synthesis
  • Energy storage and conversion
  • Micro and nano-photonics
  • Sensor for environment and healthcare
  • Devices integration and reliability
We hope this issue provides a broad overview of the current state and guidance to the future.

Invited reviews

Applications of atomic layer deposition in solar cellsOPEN ACCESSWenbin Niu, Xianglin Li, Siva Krishna Karuturi, Derrick Wenhui Fam, Hongjin Fan, Santosh Shrestha, Lydia Helena Wong and Alfred Iing Yoong Tok2015 Nanotechnology 26 064001

Viewpoints

Papers

The effect of ALD-grown Al2O3 on the refractive index sensitivity of CVD gold-coated optical fiber sensorsDavid J Mandia, Wenjun Zhou, Matthew J Ward, Howie Joress, Jeffrey J Sims, Javier B Giorgi, Jacques Albert and Seán T Barry2015 Nanotechnology 26 434002
Extremely high efficient nanoreactor with Au@ZnO catalyst for photocatalysisChung-Yi Su, Tung-Han Yang, Vitaly Gurylev, Sheng-Hsin Huang, Jenn-Ming Wu and Tsong-Pyng Perng2015 Nanotechnology 26 394001
Highly photocatalytic TiO2 interconnected porous powder fabricated by sponge-templated atomic layer depositionShengqiang Pan, Yuting Zhao, Gaoshan Huang, Jiao Wang, Stefan Baunack, Thomas Gemming, Menglin Li, Lirong Zheng, Oliver G Schmidt and Yongfeng Mei2015 Nanotechnology 26 364001
Control of the initial growth in atomic layer deposition of Pt films by surface pretreatmentJung Joon Pyeon, Cheol Jin Cho, Seung-Hyub Baek, Chong-Yun Kang, Jin-Sang Kim, Doo Seok Jeong and Seong Keun Kim2015 Nanotechnology 26 304003
Deposition of uniform Pt nanoparticles with controllable size on TiO2-based nanowires by atomic layer deposition and their photocatalytic propertiesChih-Chieh Wang, Yang-Chih Hsueh, Chung-Yi Su, Chi-Chung Kei and Tsong-Pyng Perng2015 Nanotechnology 26 254002
In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structuresT W Pi, Y H Lin, Y T Fanchiang, T H Chiang, C H Wei, Y C Lin, G K Wertheim, J Kwo and M Hong2015 Nanotechnology 26 164001
Pd nanoparticles on ZnO-passivated porous carbon by atomic layer deposition: an effective electrochemical catalyst for Li-O2 batteryXiangyi Luo, Mar Piernavieja-Hermida, Jun Lu, Tianpin Wu, Jianguo Wen, Yang Ren, Dean Miller, Zhigang Zak Fang, Yu Lei and Khalil Amine2015 Nanotechnology 26 164003
Inert ambient annealing effect on MANOS capacitor memory characteristicsNikolaos Nikolaou, Panagiotis Dimitrakis, Pascal Normand, Dimitrios Skarlatos, Konstantinos Giannakopoulos, Konstantina Mergia, Vassilios Ioannou-Sougleridis, Kaupo Kukli, Jaakko Niinistö, Kenichiro Mizohata, Mikko Ritala and Markku Leskelä2015 Nanotechnology 26 134004
Impact of the atomic layer deposition precursors diffusion on solid-state carbon nanotube based supercapacitors performancesGiuseppe Fiorentino, Sten Vollebregt, F D Tichelaar, Ryoichi Ishihara and Pasqualina M Sarro2015 Nanotechnology 26 064002
Deposition of ultra thin CuInS2 absorber layers by ALD for thin film solar cells at low temperature (down to 150 °C)Nathanaelle Schneider, Muriel Bouttemy, Pascal Genevée, Daniel Lincot and Frédérique Donsanti2015 Nanotechnology 26 054001
Photocatalytic activity and photocorrosion of atomic layer deposited ZnO ultrathin films for the degradation of methylene blueYan-Qiang Cao, Jun Chen, Hang Zhou, Lin Zhu, Xin Li, Zheng-Yi Cao, Di Wu and Ai-Dong Li2015 Nanotechnology 26 024002
Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxideStephan Ratzsch, Ernst-Bernhard Kley, Andreas Tünnermann and Adriana Szeghalmi2015 Nanotechnology 26 024003
Gas sensing properties and p-type response of ALD TiO2 coated carbon nanotubesCatherine Marichy, Nicola Donato, Mariangela Latino, Marc Georg Willinger, Jean-Philippe Tessonnier, Giovanni Neri and Nicola Pinna2015 Nanotechnology 26 024004
Air-Stable flexible organic light-emitting diodes enabled by atomic layer depositionYuan-Yu Lin, Yi-Neng Chang, Ming-Hung Tseng, Ching-Chiun Wang and Feng-Yu Tsai2015 Nanotechnology 26 024005
Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer depositionHuan-Yu Shih, Ming-Chih Lin, Liang-Yih Chen and Miin-Jang Chen2015 Nanotechnology 26 014002
NiO/nanoporous graphene composites with excellent supercapacitive performance produced by atomic layer depositionCaiying Chen, Chaoqiu Chen, Peipei Huang, Feifei Duan, Shichao Zhao, Ping Li, Jinchuan Fan, Weiguo Song and Yong Qin2014 Nanotechnology 25 504001
Electrochemical synthesis of highly ordered nanowires with a rectangular cross section using an in-plane nanochannel arrayPhilip Sergelius, Josep M Montero Moreno, Wehid Rahimi, Martin Waleczek, Robert Zierold, Detlef Görlitz and Kornelius Nielsch2014 Nanotechnology 25 504002
Highly ordered and vertically oriented TiO2/Al2O3 nanotube electrodes for application in dye-sensitized solar cellsJae-Yup Kim, Kyeong-Hwan Lee, Junyoung Shin, Sun Ha Park, Jin Soo Kang, Kyu Seok Han, Myung Mo Sung, Nicola Pinna and Yung-Eun Sung2014 Nanotechnology 25 504003
Distinguishing plasmonic absorption modes by virtue of inversed architectures with tunable atomic-layer-deposited spacer layerYun Zhang, Kenan Zhang, Tianning Zhang, Yan Sun, Xin Chen and Ning Dai2014 Nanotechnology 25 504004
Cellulose nanofiber-templated three-dimension TiO2 hierarchical nanowire network for photoelectrochemical photoanodeZhaodong Li, Chunhua Yao, Fei Wang, Zhiyong Cai and Xudong Wang2014 Nanotechnology 25 504005
Atomic layer deposition of lithium phosphates as solid-state electrolytes for all-solid-state microbatteriesBiqiong Wang, Jian Liu, Qian Sun, Ruying Li, Tsun-Kong Sham and Xueliang Sun2014 Nanotechnology 25 504007
Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteriesS Moitzheim, C S Nimisha, Shaoren Deng, Daire J Cott, C Detavernier and P M Vereecken2014 Nanotechnology 25 504008