Saturday, January 23, 2016

Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!

Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!



 
Journal of Vacuum Science & Technology A - 
First 2016 Issue Online Special Issue on ALD/ALE
2.322 
Impact Factor



 



Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles
Alexandra H. Brozena, Christopher J. Oldham and Gregory N. Parsons
J. Vac. Sci. Technol. A 34, 010801 (2016) | Read More
Atomic Layer Deposition (ALD) Articles
Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS
Yunxi Yao and Francisco Zaera
J. Vac. Sci. Technol. A 34, 01A101 (2016) | Read More
Comparison of B2O3 and BN deposited by atomic layer deposition for forming ultrashallow dopant regions by solid state diffusion
Steven Consiglio, Robert D. Clark, David O'Meara, Cory S. Wajda, Kandabara Tapily and Gert J. Leusink
J. Vac. Sci. Technol. A 34, 01A102 (2016) | Read More
          
Atomic layer deposition of molybdenum oxide from (N t Bu)2 (NMe2)2 Mo and O2 plasma
Martijn F. J. Vos, Bart Macco, Nick F. W. Thissen, Ageeth A. Bol and W. M. M. (Erwin) Kessels
J. Vac. Sci. Technol. A 34, 01A103 (2016) | Read More

Dynamic order reduction of thin-film deposition kinetics models: A reaction factorization approach
Raymond A. Adomaitis
J. Vac. Sci. Technol. A 34, 01A104 (2016) | Read More
Diffusion and interface evolution during the atomic layer deposition of TiO2 on GaAs(100) and InAs(100) surfaces
Liwang Ye and Theodosia Gougousi
J. Vac. Sci. Technol. A 34, 01A105 (2016) | Read More
Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film
Xiao Wang, Yunzhen Cao, Chao Yang, Lu Yan and Ying Li
J. Vac. Sci. Technol. A 34, 01A106 (2016) | Read More
Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers
Wenyu Zhang and James R. Engstrom
J. Vac. Sci. Technol. A 34, 01A107 (2016) | Read More
Mechanistic modeling study on process optimization and precursor utilization with atmospheric spatial atomic layer deposition
Zhang Deng, Wenjie He, Chenlong Duan, Rong Chen and Bin Shan
J. Vac. Sci. Technol. A 34, 01A108 (2016) | Read More
Low-temperature atomic layer deposition of copper(II) oxide thin films
Tomi Iivonen, Jani Hämäläinen, Benoît Marchand, Kenichiro Mizohata, Miika Mattinen, Georgi Popov, Jiyeon Kim, Roland A. Fischer and Markku Leskelä
J. Vac. Sci. Technol. A 34, 01A109 (2016) | Read More
Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
Yu-Chang Lin, Hsin-Ying Lee and Tsung-Hsin Lee
J. Vac. Sci. Technol. A 34, 01A110 (2016) | Read More
Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy
Dileep Dhakal, Khaybar Assim, Heinrich Lang, Philipp Bruener, Thomas Grehl, Colin Georgi, Thomas Waechtler, Ramona Ecke, Stefan E. Schulz and Thomas Gessner
J. Vac. Sci. Technol. A 34, 01A111 (2016) | Read More
Morphology, composition and electrical properties of SnO2:Cl thin films grown by atomic layer deposition
Hsyi-En Cheng, Chia-Hui Wen and Ching-Ming Hsu
J. Vac. Sci. Technol. A 34, 01A112 (2016) | Read More
Blistering during the atomic layer deposition of iridium
Pascal Genevée, Ernest Ahiavi, Norik Janunts, Thomas Pertsch, Maria Oliva, Ernst-Bernhard Kley and Adriana Szeghalmi
J. Vac. Sci. Technol. A 34, 01A113 (2016) | Read More
Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
Lukas Hoffmann, Detlef Theirich, Tim Hasselmann, André Räupke, Daniel Schlamm and Thomas Riedl
J. Vac. Sci. Technol. A 34, 01A114 (2016) | Read More
Atomic layer deposited cobalt oxide: An efficient catalyst for NaBH4 hydrolysis
Dip K. Nandi, Joydev Manna, Arpan Dhara, Pratibha Sharma and Shaibal K. Sarkar
J. Vac. Sci. Technol. A 34, 01A115 (2016) | Read More
           
Novel copper compounds for vapor deposition: Characterization and thermolysis
Agnes Kurek, Glenn P. A. Yap and Seán T. Barry
J. Vac. Sci. Technol. A 34, 01A116 (2016) | Read More
Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO2 films
Silma Alberton Corrêa, Simone Brizzi and Dieter Schmeisser
J. Vac. Sci. Technol. A 34, 01A117 (2016) | Read More
Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
Alexander Strobel, Hans-Dieter Schnabel, Ullrich Reinhold, Sebastian Rauer and Andreas Neidhardt
J. Vac. Sci. Technol. A 34, 01A118 (2016) | Read More
Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material
Siliang Chang, Sathees Kannan Selvaraj, Yoon-Young Choi, Seungbum Hong, Serge M. Nakhmanson and Christos G. Takoudis
J. Vac. Sci. Technol. A 34, 01A119 (2016) | Read More
Ultraviolet optical properties of aluminum fluoride thin films deposited by atomic layer deposition
John Hennessy, April D. Jewell, Kunjithapatham Balasubramanian and Shouleh Nikzad
J. Vac. Sci. Technol. A 34, 01A120 (2016) | Read More
Fast spatial atomic layer deposition of Al2O3 at low temperature (<100 C) as a gas permeation barrier for flexible organic light-emitting diode displays
Hagyoung Choi, Seokyoon Shin, Hyeongtag Jeon, Yeongtae Choi, Junghun Kim, Sanghun Kim, Seog Chul Chung and Kiyoung Oh
J. Vac. Sci. Technol. A 34, 01A121 (2016) | Read More
Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
Golnaz Karbasian, Michael S. McConnell, Alexei O. Orlov, Sergei Rouvimov and Gregory L. Snider
J. Vac. Sci. Technol. A 34, 01A122 (2016) | Read More
Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-x N thin film alloys
Ali Haider, Seda Kizir, Cagla Ozgit-Akgun, Ali Kemal Okyay and Necmi Biyikli
J. Vac. Sci. Technol. A 34, 01A123 (2016) | Read More
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
Lauri Kilpi, Oili M. E. Ylivaara, Antti Vaajoki, Jari Malm, Sakari Sintonen, Marko Tuominen, Riikka L. Puurunen and Helena Ronkainen
J. Vac. Sci. Technol. A 34, 01A124 (2016) | Read More
Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
Mustafa Alevli, Nese Gungor, Ali Haider, Seda Kizir, Shahid A. Leghari and Necmi Biyikli
J. Vac. Sci. Technol. A 34, 01A125 (2016) | Read More
Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
Akinwumi A. Amusan, Bodo Kalkofen, Hassan Gargouri, Klaus Wandel, Cay Pinnow, Marco Lisker and Edmund P. Burte
J. Vac. Sci. Technol. A 34, 01A126 (2016) | Read More
Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
Małgorzata Sowińska, Karsten Henkel, Dieter Schmeißer, Irina Kärkkänen, Jessica Schneidewind, Franziska Naumann, Bernd Gruska and Hassan Gargouri
J. Vac. Sci. Technol. A 34, 01A127 (2016) | Read More
Atomic layer deposition of alternative glass microchannel plates
Aileen O'Mahony, Christopher A. Craven, Michael J. Minot, Mark A. Popecki, Joseph M. Renaud, Daniel C. Bennis, Justin L. Bond, Michael E. Stochaj, Michael R. Foley, Bernhard W. Adams, Anil U. Mane, Jeffrey W. Elam, Camden Ertley and Oswald H. W. Siegmund
J. Vac. Sci. Technol. A 34, 01A128 (2016) | Read More
Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
Mengdi Yang, Antonius A. I. Aarnink, Alexey Y. Kovalgin, Dirk. J. Gravesteijn, Rob A. M. Wolters and Jurriaan Schmitz
J. Vac. Sci. Technol. A 34, 01A129 (2016) | Read More
Luminescence properties of lanthanide and ytterbium lanthanide titanate thin films grown by atomic layer deposition
Per-Anders Hansen, Helmer Fjellvåg, Terje G. Finstad and Ola Nilsen
J. Vac. Sci. Technol. A 34, 01A130 (2016) | Read More
Novel chemoresistive CH4 sensor with 10 ppm sensitivity based on multiwalled carbon nanotubes functionalized with SnO2 nanocrystals
Md Tanim Humayun, Ralu Divan, Yuzi Liu, Lara Gundel, Paul A. Solomon and Igor Paprotny
J. Vac. Sci. Technol. A 34, 01A131 (2016) | Read More
Atomic layer deposition of boron-containing films using B2F4 
Anil U. Mane, Jeffrey W. Elam, Alexander Goldberg, Thomas E. Seidel, Mathew D. Halls, Michael I. Current, Joseph Despres, Oleg Byl, Ying Tang and Joseph Sweeney
J. Vac. Sci. Technol. A 34, 01A132 (2016) | Read More
Electrical characterization of atomic layer deposited Al2O3/InN interfaces
Ye Jia, Amir M. Dabiran and Uttam Singisetti
J. Vac. Sci. Technol. A 34, 01A133 (2016) | Read More
Rapid visible color change and physical swelling during water exposure in triethanolamine-metalcone films formed by molecular layer deposition
Paul C. Lemaire, Christopher J. Oldham and Gregory N. Parsons
J. Vac. Sci. Technol. A 34, 01A134 (2016) | Read More
Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition
Verena E. Strempel, Daniel Löffler, Jutta Kröhnert, Katarzyna Skorupska, Benjamin Johnson, Raoul Naumann d'Alnoncourt, Matthias Driess and Frank Rosowski
J. Vac. Sci. Technol. A 34, 01A135 (2016) | Read More
Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
Sungin Suh, Seung Wook Ryu, Seongjae Cho, Jun-Rae Kim, Seongkyung Kim, Cheol Seong Hwang and Hyeong Joon Kim
J. Vac. Sci. Technol. A 34, 01A136 (2016) | Read More
Comparison of trimethylgallium and triethylgallium as "Ga" source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition
Mustafa Alevli, Ali Haider, Seda Kizir, Shahid A. Leghari and Necmi Biyikli
J. Vac. Sci. Technol. A 34, 01A137 (2016) | Read More
Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
J Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler and Fritz B. Prinz
J. Vac. Sci. Technol. A 34, 01A138 (2016) | Read More
Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction
Michael S. McConnell, Louisa C. Schneider, Golnaz Karbasian, Sergei Rouvimov, Alexei O. Orlov and Gregory L. Snider
J. Vac. Sci. Technol. A 34, 01A139 (2016) | Read More
Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
Stephen Weeks, Greg Nowling, Nobi Fuchigami, Michael Bowes and Karl Littau
J. Vac. Sci. Technol. A 34, 01A140 (2016); Read More
Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
Yu-Chang Lin, Hsin-Ying Lee and Ching-Ting Lee
J. Vac. Sci. Technol. A 34, 01A141 (2016) | Read More
Atomic layer deposition of NiS and its application as cathode material in dye sensitized solar cell
Neha Mahuli and Shaibal K. Sarkar
J. Vac. Sci. Technol. A 34, 01A142 (2016) | Read More
Standing and sitting adlayers in atomic layer deposition of ZnO
Zhengning Gao, Fei Wu, Yoon Myung, Ruixiang Fei, Ravindra Kanjolia, Li Yang and Parag Banerjee
J. Vac. Sci. Technol. A 34, 01A143 (2016) | Read More
Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition
Kyung-Mun Kang, Yong-June Choi, Geun Young Yeom and Hyung-Ho Park
J. Vac. Sci. Technol. A 34, 01A144 (2016) | Read More
Periodic oxidation for fabricating titanium oxynitride thin films via atomic layer deposition
Shinya Iwashita, Shintaro Aoyama, Masayuki Nasu, Kouji Shimomura, Naotaka Noro, Toshio Hasegawa, Yasushi Akasaka and Kohei Miyashita
J. Vac. Sci. Technol. A 34, 01A145 (2016) | Read More
Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
Kashish Sharma, Dmitri Routkevitch, Natalia Varaksa and Steven M. George
J. Vac. Sci. Technol. A 34, 01A146 (2016) | Read More
Low-temperature atomic layer deposition of TiO2 thin layers for the processing of memristive devices
Samuele Porro, Alladin Jasmin, Katarzyna Bejtka, Daniele Conti, Denis Perrone, Salvatore Guastella, Candido F. Pirri, Alessandro Chiolerio and Carlo Ricciardi
J. Vac. Sci. Technol. A 34, 01A147 (2016) | Read More
Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using "water-free" metal-halide/metal alkoxide reactants
Sarah E. Atanasov, Berç Kalanyan and Gregory N. Parsons
J. Vac. Sci. Technol. A 34, 01A148 (2016) | Read More
Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates
Alexander S. Yersak and Yung-Cheng Lee
J. Vac. Sci. Technol. A 34, 01A149 (2016) | Read More
Simulation of nucleation and growth of atomic layer deposition phosphorus for doping of advanced FinFETs
Thomas E. Seidel, Alexander Goldberg, Mat D. Halls and Michael I. Current
J. Vac. Sci. Technol. A 34, 01A150 (2016) | Read More
Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
Gu Young Cho, Seungtak Noh, Yoon Ho Lee, Sanghoon Ji, Soon Wook Hong, Bongjun Koo, Jihwan An, Young-Beom Kim and Suk Won Cha
J. Vac. Sci. Technol. A 34, 01A151 (2016) | Read More
Low temperature platinum atomic layer deposition on nylon-6 for highly conductive and catalytic fiber mats
J. Zachary Mundy, Arya Shafiefarhood, Fanxing Li, Saad A. Khan and Gregory N. Parsons
J. Vac. Sci. Technol. A 34, 01A152 (2016) | Read More
Atomic Layer Etching (ALE) Articles
Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
Dominik Metzler, Chen Li, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph and Gottlieb S. Oehrlein
J. Vac. Sci. Technol. A 34, 01B101 (2016) | Read More
Application of cyclic fluorocarbon/argon discharges to device patterning
Dominik Metzler, Kishore Uppireddi, Robert L. Bruce, Hiroyuki Miyazoe, Yu Zhu, William Price, Ed S. Sikorski, Chen Li, Sebastian U. Engelmann, Eric A. Joseph and Gottlieb S. Oehrlein
J. Vac. Sci. Technol. A 34, 01B102 (2016) | Read More 
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
Ashish V. Jagtiani, Hiroyuki Miyazoe, Josephine Chang, Damon B. Farmer, Michael Engel, Deborah Neumayer, Shu-Jen Han, Sebastian U. Engelmann, David R. Boris, Sandra C. Hernández, Evgeniya H. Lock, Scott G. Walton and Eric A. Joseph
J. Vac. Sci. Technol. A 34, 01B103 (2016) | Read More
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