Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!

Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!

Journal of Vacuum Science & Technology A -  First 2016 Issue Online Special Issue on ALD/ALE 2.322  Impact Factor

These articles have been made free to download for a limited time Review Articles Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles Alexandra H. Brozena, Christopher J. Oldham and Gregory N. Parsons J. Vac. Sci. Technol. A 34, 010801 (2016) | Read More Atomic Layer Deposition (ALD) Articles Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS Yunxi Yao and Francisco Zaera J. Vac. Sci. Technol. A 34, 01A101 (2016) | Read More Comparison of B2O3 and BN deposited by atomic layer deposition for forming ultrashallow dopant regions by solid state diffusion Steven Consiglio, Robert D. Clark, David O'Meara, Cory S. Wajda, Kandabara Tapily and Gert J. Leusink J. Vac. Sci. Technol. A 34, 01A102 (2016) | Read More            Atomic layer deposition of molybdenum oxide from (N t Bu)2 (NMe2)2 Mo and O2 plasma Martijn F. J. Vos, Bart Macco, Nick F. W. Thissen, Ageeth A. Bol and W. M. M. (Erwin) Kessels J. Vac. Sci. Technol. A 34, 01A103 (2016) | Read More Dynamic order reduction of thin-film deposition kinetics models: A reaction factorization approach Raymond A. Adomaitis J. Vac. Sci. Technol. A 34, 01A104 (2016) | Read More Diffusion and interface evolution during the atomic layer deposition of TiO2 on GaAs(100) and InAs(100) surfaces Liwang Ye and Theodosia Gougousi J. Vac. Sci. Technol. A 34, 01A105 (2016) | Read More Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film Xiao Wang, Yunzhen Cao, Chao Yang, Lu Yan and Ying Li J. Vac. Sci. Technol. A 34, 01A106 (2016) | Read More Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers Wenyu Zhang and James R. Engstrom J. Vac. Sci. Technol. A 34, 01A107 (2016) | Read More Mechanistic modeling study on process optimization and precursor utilization with atmospheric spatial atomic layer deposition Zhang Deng, Wenjie He, Chenlong Duan, Rong Chen and Bin Shan J. Vac. Sci. Technol. A 34, 01A108 (2016) | Read More Low-temperature atomic layer deposition of copper(II) oxide thin films Tomi Iivonen, Jani Hämäläinen, Benoît Marchand, Kenichiro Mizohata, Miika Mattinen, Georgi Popov, Jiyeon Kim, Roland A. Fischer and Markku Leskelä J. Vac. Sci. Technol. A 34, 01A109 (2016) | Read More Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition Yu-Chang Lin, Hsin-Ying Lee and Tsung-Hsin Lee J. Vac. Sci. Technol. A 34, 01A110 (2016) | Read More Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy Dileep Dhakal, Khaybar Assim, Heinrich Lang, Philipp Bruener, Thomas Grehl, Colin Georgi, Thomas Waechtler, Ramona Ecke, Stefan E. Schulz and Thomas Gessner J. Vac. Sci. Technol. A 34, 01A111 (2016) | Read More Morphology, composition and electrical properties of SnO2:Cl thin films grown by atomic layer deposition Hsyi-En Cheng, Chia-Hui Wen and Ching-Ming Hsu J. Vac. Sci. Technol. A 34, 01A112 (2016) | Read More Blistering during the atomic layer deposition of iridium Pascal Genevée, Ernest Ahiavi, Norik Janunts, Thomas Pertsch, Maria Oliva, Ernst-Bernhard Kley and Adriana Szeghalmi J. Vac. Sci. Technol. A 34, 01A113 (2016) | Read More Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition Lukas Hoffmann, Detlef Theirich, Tim Hasselmann, André Räupke, Daniel Schlamm and Thomas Riedl J. Vac. Sci. Technol. A 34, 01A114 (2016) | Read More Atomic layer deposited cobalt oxide: An efficient catalyst for NaBH4 hydrolysis Dip K. Nandi, Joydev Manna, Arpan Dhara, Pratibha Sharma and Shaibal K. Sarkar J. Vac. Sci. Technol. A 34, 01A115 (2016) | Read More             Novel copper compounds for vapor deposition: Characterization and thermolysis Agnes Kurek, Glenn P. A. Yap and Seán T. Barry J. Vac. Sci. Technol. A 34, 01A116 (2016) | Read More Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO2 films Silma Alberton Corrêa, Simone Brizzi and Dieter Schmeisser J. Vac. Sci. Technol. A 34, 01A117 (2016) | Read More Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films Alexander Strobel, Hans-Dieter Schnabel, Ullrich Reinhold, Sebastian Rauer and Andreas Neidhardt J. Vac. Sci. Technol. A 34, 01A118 (2016) | Read More Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material Siliang Chang, Sathees Kannan Selvaraj, Yoon-Young Choi, Seungbum Hong, Serge M. Nakhmanson and Christos G. Takoudis J. Vac. Sci. Technol. A 34, 01A119 (2016) | Read More Ultraviolet optical properties of aluminum fluoride thin films deposited by atomic layer deposition John Hennessy, April D. Jewell, Kunjithapatham Balasubramanian and Shouleh Nikzad J. Vac. Sci. Technol. A 34, 01A120 (2016) | Read More Fast spatial atomic layer deposition of Al2O3 at low temperature (<100 C) as a gas permeation barrier for flexible organic light-emitting diode displays Hagyoung Choi, Seokyoon Shin, Hyeongtag Jeon, Yeongtae Choi, Junghun Kim, Sanghun Kim, Seog Chul Chung and Kiyoung Oh J. Vac. Sci. Technol. A 34, 01A121 (2016) | Read More Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions Golnaz Karbasian, Michael S. McConnell, Alexei O. Orlov, Sergei Rouvimov and Gregory L. Snider J. Vac. Sci. Technol. A 34, 01A122 (2016) | Read More Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-x N thin film alloys Ali Haider, Seda Kizir, Cagla Ozgit-Akgun, Ali Kemal Okyay and Necmi Biyikli J. Vac. Sci. Technol. A 34, 01A123 (2016) | Read More Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon Lauri Kilpi, Oili M. E. Ylivaara, Antti Vaajoki, Jari Malm, Sakari Sintonen, Marko Tuominen, Riikka L. Puurunen and Helena Ronkainen J. Vac. Sci. Technol. A 34, 01A124 (2016) | Read More Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition Mustafa Alevli, Nese Gungor, Ali Haider, Seda Kizir, Shahid A. Leghari and Necmi Biyikli J. Vac. Sci. Technol. A 34, 01A125 (2016) | Read More Ag films grown by remote plasma enhanced atomic layer deposition on different substrates Akinwumi A. Amusan, Bodo Kalkofen, Hassan Gargouri, Klaus Wandel, Cay Pinnow, Marco Lisker and Edmund P. Burte J. Vac. Sci. Technol. A 34, 01A126 (2016) | Read More Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study Małgorzata Sowińska, Karsten Henkel, Dieter Schmeißer, Irina Kärkkänen, Jessica Schneidewind, Franziska Naumann, Bernd Gruska and Hassan Gargouri J. Vac. Sci. Technol. A 34, 01A127 (2016) | Read More Atomic layer deposition of alternative glass microchannel plates Aileen O'Mahony, Christopher A. Craven, Michael J. Minot, Mark A. Popecki, Joseph M. Renaud, Daniel C. Bennis, Justin L. Bond, Michael E. Stochaj, Michael R. Foley, Bernhard W. Adams, Anil U. Mane, Jeffrey W. Elam, Camden Ertley and Oswald H. W. Siegmund J. Vac. Sci. Technol. A 34, 01A128 (2016) | Read More Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor Mengdi Yang, Antonius A. I. Aarnink, Alexey Y. Kovalgin, Dirk. J. Gravesteijn, Rob A. M. Wolters and Jurriaan Schmitz J. Vac. Sci. Technol. A 34, 01A129 (2016) | Read More Luminescence properties of lanthanide and ytterbium lanthanide titanate thin films grown by atomic layer deposition Per-Anders Hansen, Helmer Fjellvåg, Terje G. Finstad and Ola Nilsen J. Vac. Sci. Technol. A 34, 01A130 (2016) | Read More Novel chemoresistive CH4 sensor with 10 ppm sensitivity based on multiwalled carbon nanotubes functionalized with SnO2 nanocrystals Md Tanim Humayun, Ralu Divan, Yuzi Liu, Lara Gundel, Paul A. Solomon and Igor Paprotny J. Vac. Sci. Technol. A 34, 01A131 (2016) | Read More Atomic layer deposition of boron-containing films using B2F4  Anil U. Mane, Jeffrey W. Elam, Alexander Goldberg, Thomas E. Seidel, Mathew D. Halls, Michael I. Current, Joseph Despres, Oleg Byl, Ying Tang and Joseph Sweeney J. Vac. Sci. Technol. A 34, 01A132 (2016) | Read More Electrical characterization of atomic layer deposited Al2O3/InN interfaces Ye Jia, Amir M. Dabiran and Uttam Singisetti J. Vac. Sci. Technol. A 34, 01A133 (2016) | Read More Rapid visible color change and physical swelling during water exposure in triethanolamine-metalcone films formed by molecular layer deposition Paul C. Lemaire, Christopher J. Oldham and Gregory N. Parsons J. Vac. Sci. Technol. A 34, 01A134 (2016) | Read More Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition Verena E. Strempel, Daniel Löffler, Jutta Kröhnert, Katarzyna Skorupska, Benjamin Johnson, Raoul Naumann d'Alnoncourt, Matthias Driess and Frank Rosowski J. Vac. Sci. Technol. A 34, 01A135 (2016) | Read More Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor Sungin Suh, Seung Wook Ryu, Seongjae Cho, Jun-Rae Kim, Seongkyung Kim, Cheol Seong Hwang and Hyeong Joon Kim J. Vac. Sci. Technol. A 34, 01A136 (2016) | Read More Comparison of trimethylgallium and triethylgallium as "Ga" source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition Mustafa Alevli, Ali Haider, Seda Kizir, Shahid A. Leghari and Necmi Biyikli J. Vac. Sci. Technol. A 34, 01A137 (2016) | Read More Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors J Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler and Fritz B. Prinz J. Vac. Sci. Technol. A 34, 01A138 (2016) | Read More Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction Michael S. McConnell, Louisa C. Schneider, Golnaz Karbasian, Sergei Rouvimov, Alexei O. Orlov and Gregory L. Snider J. Vac. Sci. Technol. A 34, 01A139 (2016) | Read More Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane Stephen Weeks, Greg Nowling, Nobi Fuchigami, Michael Bowes and Karl Littau J. Vac. Sci. Technol. A 34, 01A140 (2016); Read More Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition Yu-Chang Lin, Hsin-Ying Lee and Ching-Ting Lee J. Vac. Sci. Technol. A 34, 01A141 (2016) | Read More Atomic layer deposition of NiS and its application as cathode material in dye sensitized solar cell Neha Mahuli and Shaibal K. Sarkar J. Vac. Sci. Technol. A 34, 01A142 (2016) | Read More Standing and sitting adlayers in atomic layer deposition of ZnO Zhengning Gao, Fei Wu, Yoon Myung, Ruixiang Fei, Ravindra Kanjolia, Li Yang and Parag Banerjee J. Vac. Sci. Technol. A 34, 01A143 (2016) | Read More Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition Kyung-Mun Kang, Yong-June Choi, Geun Young Yeom and Hyung-Ho Park J. Vac. Sci. Technol. A 34, 01A144 (2016) | Read More Periodic oxidation for fabricating titanium oxynitride thin films via atomic layer deposition Shinya Iwashita, Shintaro Aoyama, Masayuki Nasu, Kouji Shimomura, Naotaka Noro, Toshio Hasegawa, Yasushi Akasaka and Kohei Miyashita J. Vac. Sci. Technol. A 34, 01A145 (2016) | Read More Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes Kashish Sharma, Dmitri Routkevitch, Natalia Varaksa and Steven M. George J. Vac. Sci. Technol. A 34, 01A146 (2016) | Read More Low-temperature atomic layer deposition of TiO2 thin layers for the processing of memristive devices Samuele Porro, Alladin Jasmin, Katarzyna Bejtka, Daniele Conti, Denis Perrone, Salvatore Guastella, Candido F. Pirri, Alessandro Chiolerio and Carlo Ricciardi J. Vac. Sci. Technol. A 34, 01A147 (2016) | Read More Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using "water-free" metal-halide/metal alkoxide reactants Sarah E. Atanasov, Berç Kalanyan and Gregory N. Parsons J. Vac. Sci. Technol. A 34, 01A148 (2016) | Read More Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates Alexander S. Yersak and Yung-Cheng Lee J. Vac. Sci. Technol. A 34, 01A149 (2016) | Read More Simulation of nucleation and growth of atomic layer deposition phosphorus for doping of advanced FinFETs Thomas E. Seidel, Alexander Goldberg, Mat D. Halls and Michael I. Current J. Vac. Sci. Technol. A 34, 01A150 (2016) | Read More Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells Gu Young Cho, Seungtak Noh, Yoon Ho Lee, Sanghoon Ji, Soon Wook Hong, Bongjun Koo, Jihwan An, Young-Beom Kim and Suk Won Cha J. Vac. Sci. Technol. A 34, 01A151 (2016) | Read More Low temperature platinum atomic layer deposition on nylon-6 for highly conductive and catalytic fiber mats J. Zachary Mundy, Arya Shafiefarhood, Fanxing Li, Saad A. Khan and Gregory N. Parsons J. Vac. Sci. Technol. A 34, 01A152 (2016) | Read More Atomic Layer Etching (ALE) Articles Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma Dominik Metzler, Chen Li, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph and Gottlieb S. Oehrlein J. Vac. Sci. Technol. A 34, 01B101 (2016) | Read More Application of cyclic fluorocarbon/argon discharges to device patterning Dominik Metzler, Kishore Uppireddi, Robert L. Bruce, Hiroyuki Miyazoe, Yu Zhu, William Price, Ed S. Sikorski, Chen Li, Sebastian U. Engelmann, Eric A. Joseph and Gottlieb S. Oehrlein J. Vac. Sci. Technol. A 34, 01B102 (2016) | Read More  Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources Ashish V. Jagtiani, Hiroyuki Miyazoe, Josephine Chang, Damon B. Farmer, Michael Engel, Deborah Neumayer, Shu-Jen Han, Sebastian U. Engelmann, David R. Boris, Sandra C. Hernández, Evgeniya H. Lock, Scott G. Walton and Eric A. Joseph J. Vac. Sci. Technol. A 34, 01B103 (2016) | Read More Submit your latest research articles and letters on thin films, surfaces and interfaces to JVST A: Click Here to Submit