Tuesday, October 6, 2015

Photoshow : ALD Lab Dresden Symposium at SEMICON Europa 2015

SEMICON Europa this year has turned out to be a major event for ALD and exciting nanoelectronic materials research. Here are photos taken from The ALD Day October 6th, 2015!

More details on this event you can find here : http://baldengineering.blogspot.de/2015/10/ald-ale-and-exciting-nanoelectronic.html

We are already looking forward to SEMICON Europa 2016 in Grenoble, France and to co-chair an ALD Sympoium there yet one more time!

SEMICON Europa ALD 2014, Grenoble : http://baldengineering.blogspot.de/2014/10/voila-3rd-ald-lab-dresden-symposium-at.html



Columbus, Tuesday Oct 6, 13:45, ALD / ALE Sympoium of The ALD Lab Dresden, Messe Dreaden, Germany





Waiting for the ALD Storm!


Welcome
Prof. Johann W. Bartha, TU Dresden


In situ monitoring of Atomic Layer Deposition in porous materials
Martin Knaut, TU Dresden



Passivation of MEMS by Atomic Layer Deposition
Matthias Schwille, Robert Bosch


Symposium is full - please help me throw out a PVD guy


Growth Monitoring by XPS and LEIS Investigations of Ultrathin Copper Films Deposited by Atomic Layer Deposition
Dileep Dhakal, TU Chemnitz/FhG ENAS


High-k dielectrics by ALD for BEOL compatible MIM
Wenke Weinreich, FhG IPMS-CNT


ALD coatings for applications as permeation barrier and protective layer in fiber-reinforced materials
Mario Krug, FhG IKTS



ALD for solar cell application
Ingo Dirnstorfer, NaMLab



Plasma enhanced ALD process for TiO2- and WO3- films
Alexander Strobel, FH Zwickau


Why do we need Atomic Layer Etching
Jonas Sundqvist, Lund University/TU Dresden


Spatial Atomic Layer Deposition and Atomic Layer Etching
Prof. Fred Roozeboom, TU Eindhoven / TNO Eindhoven


Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?
Harm Knoops, Oxford Instruments/TU Eindhoven


Hardmask and side wall protection during dry etching with plasma enhanced deposition during dry etching for ALE purposes
Stephan Wege, Plasway


Industrial High Throughput Atomic Layer Deposition Equipment and Process for OLED Encapsulation
Jacques Kools, Encapsulix


Monolayer controlled deposition of 2D transition metal dichalcogenides on large area substrates
Annelies Delabie, Imec



Selective Deposition as Enabler for Shrinking Device Dimensions

Suvi Haukka, Executive Scientist, ASM Microchemistry Ltd.




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