Tuesday, March 27, 2018

The Critical Materials Council Conference 2018

For people who think materials matter...
Materials, immediate and future, critical to semiconductor devices
Final Agenda features:
Keynote Speaker: David Bloss, VP, Technology and Manufacturing Group Director, Lithography Technology Sourcing, Global Supply Management, Intel Corporation,
"Patterning Challenges and Fab Materials for Future ICs
Also, presenting on Emerging Materials: 
  • Glen Wilk, VP of ALD Products of ASM, providing an insight on High K limits and SAQP challenges
  • Dave Thompson, Sr. Director of Applied Materials, presenting insights on Ruthenium
And focused on Immediate Materials Challenges:
  • Mark Scholefield, Sr. Member of the Technical Staff of GlobalFoundries, providing challenges surrounding silicon wafer quality and associated roadmaps
  • Ken Unfried, Sr. Manager of Linde, providing the latest in issues surrounding neon ad xenon recycling
 ... among a host of other germane and magnetic speakers. The Conference also includes the popular "Not-so-usual Round Tables" with scintillating topics and networking opportunities for all.
The CMC Conference provides:
* Updates on market dynamics and regulations
* Trends in the profitable control of all fab materials
* Technology forecasts for future critical materials

Register by April 15th and get entered into a drawing to win a "WiFi Sports Camera."
http://cmcfabs.org/registration/  Courtesy of MegaFluidSystems. 
Click here for the updated agenda
Schedule Details:
Welcome Reception April 25th evening
Sessions I & II, April 26th
Session III, April 27 morning 
Welcome reception, lunch on 26th & coffee/tea breaks are included.

The conference follows the CMC Fabs F2F meeting (on April 24-25) and CMC Members only (Associates and Fabs) Joint Session (on April 25, 2-5pm), located nearby at NXP. For more information about these meetings and/or the Conference, please contact Meena Sher by email by clicking here.

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