[Solid State Technology LINK]As the world of advanced manufacturing enters the
sub-nanometer scale era, it is clear that ALD, MLD and SAM represent
viable options for delivering the required few-atoms-thick layers
required with uniformity, conformality, and purity.
BY BARRY ARKLES, JONATHAN GOFF, Gelest Inc., Morrisville PA; ALAIN E. KALOYEROS, SUNY Polytechnic Institute, Albany, NY
Device and system technologies across several industries are on the
verge of entering the sub-nanometer scale regime. This regime requires
processing techniques that enable exceptional atomic level control of
the thickness, uniformity, and morphology of the exceedingly thin (as
thin as a few atomic layers) film structures required to form such
devices and systems.[1]
Full article : Solid State Technology LINK