Wednesday, November 11, 2015

Prof. Erwin Kessels TU Eindoven is appointed Associate Editor of the JVSTA

Professor W.M.M. (Erwin) Kessels of Eindhoven University of Technology Department of Applied Physics is appointed as an Associate Editor of the Journal of Vacuum Science & Technology(JVSTA). JVSTA has become a very important journal for ALD since it runs a special ALD issue after each International ALD conference. Here is a link to the upcoming issue : http://scitation.aip.org/upload/AVS/JVA/JVST_Special_Issue.pdf
 
 
Congratulations Erwin!

Biography

Erwin Kessels is a full professor at the Department of Applied Physics of the Eindhoven University of Technology TU/e (The Netherlands). He is also the scientific director of the NanoLab@TU/e facilities which provides open-access clean room infrastructure for R&D in nanotechnology. Erwin received his M.Sc. and Ph.D. degree (with highest honors) in Applied Physics from the TU/e in 1996 and 2000, respectively. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award for "pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth". From the Netherlands Organization of Scientific Research, he received a grant in 2010 to set up a large research program on "nanomanufacturing" in order to bridge the gap between nanoscience/nanotechnology and industrial application. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within nanoelectronics and photovoltaics. Within the field of ALD, he has contributed to the field most prominently by his work on plasma-assisted ALD and his research related to ALD for photovoltaics. Erwinchaired the International Conference on Atomic Layer Deposition in 2008 and he has published over 200 papers and holds 2 patents.