Friday, November 20, 2015

Can ALD save Moore´s Law?

Can ALD save Moore´s Law? - I would say it already did at the introduction og HKMG and some other things. Here is a great peace by Mark Lapedus with some insights from the leading extperts of industry and academia and I selected to high light some of them below:

Can Nano-Patterning Save Moore’s Law?

Selective deposition is showing promise in the lab, but it’s a long way from there to production.

For years the academic community has explored a novel technology called selective deposition. Then, more than a year ago, Intel spearheaded an effort to bring the technology from the lab to the fab at 7nm or 5nm. Today, selective deposition is still in R&D, but it is gaining momentum in the industry.

 “In order to make ALD-enabled nano-patterning available in the semiconductor industry, careful ALD precursor and reactant selections are required,” Samsung’s Han Jin Lim said.  

“There are a couple of places where selective deposition has been done in the past. But the applications have been pretty specific, where we have gotten our arms around the defectivity issues,” said Dave Hemker, senior vice president and chief technology officer at Lam Research. “But anytime you go selective and deposition, you’ve have to make sure the defectivity and other issues are solved. As we learn more about it, we’ll see more applications coming out of it.”

“With SAM, it might be possible to do selective-area ALD or CVD by area-deactivation,” said Erwin Kessels, a professor at the Eindhoven University of Technology. “But this only provides a solution in cases where the substrate is already patterned. Selective deposition by area-deactivation doesn’t really help you in most cases when you really want to generate patterns from the bottom-up, which is the ultimate aim. Yet, it would still be helpful to reduce the number of litho steps.”

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