Tuesday, November 17, 2015

CVD Equipment Corporation Revenue Rose 20.1% to Record-breaking Levels

It is soon Christmas so I think we ALD guys can be nice to the CVD guys. Some brief news from the world of CVD: CVD Equipment Corporation announced that it has achieved record-breaking revenue for both the three and nine month periods ended September 30, 2015. CVD’s revenue rose 20.1% to a record-breaking level of $10.6 million for the current quarter ending September 30, 2015 compared to $8.9 million in revenue for the quarter ended September 30, 2014. For the current nine month period, CVD’s revenue rose 59.0% to a record-breaking $30.8 million compared to $19.4 million in revenue for the nine month period ended September 30, 2014.  CVD also reported net earnings of $0.8 million or $0.13 per basic and diluted share and $2.8 million or $0.46 per share basic and $0.45 per share diluted for those respective periods compared to earnings of $0.9 million or $0.14 per share basic and diluted and $0.8 million or $0.13 per share basic and diluted for the three and nine months ended September 30, 2014



Full report: http://www.cvdequipment.com/2015/11/16/cvd-revenue-rose-20-1-to-record-breaking-levels/

Joiking aside,  CVD Equipment Corporation actually have an ALD Product offering. I do not know too much about this and here is the generic information that is available through their web:

Atomic layer deposition (ALD) is a thin film deposition process that allows for atomic layer thickness resolution, excellent conformity of high aspect ratio surfaces, and pinhole-free layers. This is achieved by sequential formation of atomic layers in a self-limiting reaction.


ALD is commonly used in the semiconductor industry for high-k dielectric films in CMOS processing, memory devices, MEMS, and sensors. The atomic layer deposition system is used for development of protective / functional coatings in fuel cells and other applications for corrosion / wear resistance. It can also be used to coat high aspect ratio structures like nanowires and nanotubes for next generation device development.

Oxides: Al2O3, TiO2, SnO, HfO2, ZnO, Fe2O3
Nitrides: TiN, TaN, WN
Metals: Cu, Ru, Ir, W and more.