The agenda for the ALD Lab Dresden Symposium is now set! If you are attending and representing a company or any organization with an offering in ALD or ALE - please brig alog your flyers, coffee mugs, hats and pensand I will sort out a table that is bug enought for displaying it.
![](//3.bp.blogspot.com/-q0-Svt9okMI/VguBT6f6YqI/AAAAAAAAB3s/VPpeGkk_QyY/s400/ALD%2BFlyers.jpg)
AGENDA
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Tuesday, 6 October 2015
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09:00 | Welcome | Organized by:
![](https://lh3.googleusercontent.com/blogger_img_proxy/AEn0k_saEsDMfCcWdXPzdWAdQ4TNWdImR3UqNQ_Ag7Pk73sAGAxRoS8LPX3M9D3x3T7mFxZ8RxBPywoVXETYwN_1HLNPJsB2_AP3zL5XuH5VHyTsO3WWyZDVObxGCxkvjjUa3qpeEgVK9tffQpu3wDegroyu7JBoKy6g2kGgu8xsJaffVCg=s0-d)
Supported by:
![cost logo](https://lh3.googleusercontent.com/blogger_img_proxy/AEn0k_v7aghazeGuQh2-RuHMIXYDBRmU9Lo0Q6sd0592GeX9HYVhCyjCcuufHIfoaqzGyfzk25fuEGQlhaa4setOmWvVA6IG9hvtGO0Z2IYMNX6uvZC9VUDliObc6UlKdF_JKAXTzmy08tHhgUwvmQplmbtQB34Iqi2ON41aD8Wqs9Kz=s0-d)
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| Prof. Johann W. Bartha, TU Dresden |
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09:15 | In situ monitoring of Atomic Layer Deposition in porous materials |
| Martin Knaut, TU Dresden |
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09:40 | Passivation of MEMS by Atomic Layer Deposition |
| Matthias Schwille, Robert Bosch |
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10:05 | Growth Monitoring by XPS and LEIS Investigations of Ultrathin Copper Films Deposited by Atomic Layer Deposition |
| Dileep Dhakal, TU Chemnitz/FhG ENAS |
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10:30 | High-k dielectrics by ALD for BEOL compatible MIM |
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| Wenke Weinreich, FhG IPMS-CNT |
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10:55 | ALD coatings for applications as permeation barrier and protective layer in fiber-reinforced materials |
| Mario Krug, FhG IKTS |
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11:20 | ALD for solar cell application |
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| Ingo Dirnstorfer, NaMLab |
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11:45 | Plasma enhanced ALD process for TiO2- and WO3- films |
| Alexander Strobel, FH Zwickau |
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12:10 | Lunch Break (Conversation, Networking, Finger food) |
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13:00 | Why do we need Atomic Layer Etching |
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| Jonas Sundqvist, Lund University/TU Dresden |
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13:25 | Spatial Atomic Layer Deposition and Atomic Layer Etching |
| Prof. Fred Roozeboom, TU Eindhoven/ TNO Eindhoven |
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13:50 | Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition? |
| Harm Knoops, Oxford Instruments/TU Eindhoven |
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14:15 | Hardmask and side wall protection during dry etching with plasma enhanced deposition during dry etching for ALE purposes |
| Stephan Wege, Plasway |
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14:40 | Industrial High Throughput Atomic Layer Deposition Equipment and Process for OLED Encapsulation |
| Jacques Kools, Encapsulix |
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15:05 | Closing Remarks / Wrap Up |
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| Prof. Johann W. Bartha, TU Dresden |
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15:10 | End |
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