Delphine Longrie, Davy Deduytsche and Christophe Detavernier
J. Vac. Sci. Technol. A 32, 010802 (2014) |
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Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications
Philipp S. Maydannik, Tommi O. Kääriäinen, Kimmo
Lahtinen, David C. Cameron, Mikko Söderlund, Pekka Soininen, Petri
Johansson, Jurkka Kuusipalo, Lorenza Moro and Xianghui Zeng
J. Vac. Sci. Technol. A 32, 051603 (2014)|
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Low sheet resistance titanium nitride
films by low-temperature plasma-enhanced atomic layer deposition using
design of experiments methodology
Micheal Burke, Alan Blake, Ian M. Povey, Michael
Schmidt, Nikolay Petkov, Patrick Carolan and Aidan J. Quinn
J. Vac. Sci. Technol. A 32, 031506 (2014) |
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Analytic expressions for atomic layer
deposition: Coverage, throughput, and materials utilization in
cross-flow, particle coating, and spatial atom
ic layer deposition
Angel Yanguas-Gil and Jeffrey W. Elam
J. Vac. Sci. Technol. A 32, 031504 (2014) |
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Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness
Alexander S. Yersak, Yung C. Lee, Joseph A. Spencer and Markus D. Groner
J. Vac. Sci. Technol. A 32, 01A130 (2014)
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In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition
Kilian Devloo-Casier, Karl F. Ludwig, Christophe Detavernier and Jolien Dendooven
J. Vac. Sci. Technol. A 32, 010801 (2014) |
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Capacitance and conductance versus voltage characterization
of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25° C < T < 200°C
Karsten Henkel, Hassan Gargouri, Bernd Gruska, Michael Arens, Massimo Tallarida and Dieter Schmeißer
J. Vac. Sci. Technol. A 32, 01A107 (2014) |
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Hybrid inorganic-organic superlattice structures with atomic layer deposition/molecular layer deposition
Tommi Tynell, Hisao Yamauchi and Maarit Karppinen
J. Vac. Sci. Technol. A 32, 01A105 (2014)|
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Vibration atomic layer deposition for conformal nanoparticle coating
Suk Won Park, Jun Woo Kim, Hyung Jong Choi and Joon Hyung Shim
J. Vac. Sci. Technol. A 32, 01A115 (2014) |
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Selective atomic layer deposition of
zirconia on copper patterned silicon substrates using ethanol as oxygen
source as well as copper reductant
Sathees Kannan Selvaraj, Jaya Parulekar and Christos G. Takoudis
J. Vac. Sci. Technol. A 32, 010601 (2014)|
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