ALD at The 228th ECS Meeting October 11-15, 2015 in Phoenix AZ

Here are some interesting sessions at the upcoming The 228th ECS Meeting October 11-15, 2015 in Phoenix Arizona. Looking forward to hear about the outcome of the panel discussion on ALE!

G01 Atomic Layer Deposition Applications 11

Sponsor(s): Electronics and Photonics, Dielectric Science and Technology

Lead Organizer: F. Roozeboom (Eindhoven University of Technology)

Co-organizers: Jeffrey W Elam (Argonne National Laboratory) , A. Londergan (Qualcomm Technologies, Inc.) , O. van der Straten (IBM Research) , Annelies Delabie (imec) and Stefan De Gendt (imec vzw)

Tuesday, October 13, 2015

08:30-10:00

Energy Applications I

Phoenix East

Chair(s): Jeffrey W Elam and Fred Roozeboom

10:00-12:20

Energy Applications II

Phoenix East

Chair(s): Jeffrey W Elam and Neil P. Dasgupta

14:00-16:40

Textile and Related Coatings

Phoenix East

Chair(s): J. W. Elam and Helmut Baumgart

16:40-17:20

Characterization

Phoenix East

Chair(s): Stefan De Gendt and Jesse S Jur

Wednesday, October 14, 2015

09:00-10:00

New Materials and Processes I

Phoenix East

Chair(s): Stefan De Gendt and Paul Raymond Chalker

10:00-12:20

New Materials and Processes II

Phoenix East

Chair(s): O. van der Straten and Stefan De Gendt

14:00-15:40

Metal Deposition and Applications I

Phoenix East

Chair(s): O. van der Straten and Sean Barry

15:40-16:40

Metal Deposition and Applications II

Phoenix East

Chair(s): O. van der Straten and Soo-Hyun Kim

18:00-20:00

G01 Poster Session

West Hall 1

Chair(s): Fred Roozeboom

Thursday, October 15, 2015

08:00-10:00

Atomic Layer Etching I

Phoenix East

Chair(s): Fred Roozeboom and Thorsten Lill

10:00-11:40

Atomic Layer Etching II

Phoenix East

Chair(s): Craig Huffman and Steven M. George

11:40-12:40

Panel Discussion on Atomic Layer Etching

Phoenix East

Chair(s): Craig Huffman