Tuesday, June 9, 2015

JVST A Special Issue on Atomic Layer Deposition 2016

As usual JVST A is Soliciting Research Articles for Publication in a Special January/February 2016 Issue on Atomic Layer Deposition.

This special issue is planned in collaboration with the 15th International Conference on Atomic Layer Deposition (ALD 2015) to be held in Portland, Oregon during June 28-July 1, 2015. The Special Issue will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles are expected to be based on material presented at ALD 2015,research articles that are on ALD but were not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD.

Manuscript Deadline: August 30, 2015 Click Here to Submit

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