Monday, May 11, 2015

New ALD Startup company from Harvard - Anric Technologies

As a new startup company from Boston - Anric Technologies introduces the AT-400. ALD equipment and processes developed from the ground up with three major design goals: ease of use, reproducibility and value.  the AT-400 ALD system is the first product of this design philosophy (

Acording to information at their Japanese representation most of us will identify to famous ALD personalities without any knowledge in Japanese ( - so I assume Prof. Roy Gordon and Philippe de Rouffignac are both involved in this new start up - I will update as soon as I find more infromation:
Philippe de Rouffignac, Ph.D は現在Harvard University, Department of Chemistry (Dr. Roy Gordon)、及びCenter for Nanoscale Systems でCVD/ALD のプレカーサなどの開発を担当。
学生時代もDr. Gordon の元で5台のALDを手作りし、メーカー勤務時代もALD開発に従事。

Basic Facts
  • Up to 4” diameter sample
  • Chamber temperatures from RT to 350 °C ± 1 °C
  • Precursor temperatures from RT to 150 °C ± 2 °C with optional heating jackets
  • Variable process pressure control 0.1 to 1.5 torr
  • All metal sealed system upstream of sample
    • No atmospheric contaminants at sample
  • Smallest footprint on market, cleanroom compatible
  • Precise precursor dosing with defined dose volumes
    • Reduces process and dose variability common to competitors
  • Fast cycling capability
    • 6-10 cycles/min or up to 1.2nm/min Al2O3 (best in class)
    • Exposure control for deposition on high aspect ratio samples
  • Robust touchscreen PLC control system
    • roven recipes pre-loaded in controller
  • Simple system maintenance and integrated vacuum interlock
  • User defined sample fixturing available
  • Streamlined chamber design and small chamber volume
    • Designed for high quality growth on small samples
  • 3 organometallic sources - standard 
    • All three can be heated up to 150 degrees C
    • Our inert gas pressure assist (IGPA) is an option for ultra low vapor pressure precursors
    • 2 counter reactants - standard
    • 1 liquid source such as H2O or H2O
    • 1 gas source such as O2 or NH3
    • 2 gas sources can be used as well


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