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Similar to the last years, NaMLab invites to the Novel High-k
Application Workshop on March 10th, 2015. New challenges offered by the
application of high-k dielectric materials in micro– and nanoelectronics
will be discussed by more than 80 participants from industry, research
institutes and universities. NaMLab created with the workshop a
stimulating European platform for application-oriented scientist to
exchange ideas and discuss latest experimental results on
MIM-capacitors, process technology, leakage & reliability as well as
characterization of high-k dielectrics integrated in silicon based
micro– and nanoelectronics.
Live from The High-k Workshop at NaMLab Dresden Germany. The Coffee is break sponsored by Oxford Instruments and the event itself by EU COST - Hooking together European research in atomic layer deposition (HERALD)
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