Showing posts with label Webinar. Show all posts
Showing posts with label Webinar. Show all posts

Wednesday, October 28, 2020

TechInsights Webinar: ALD/ALE Process in Commercially Available Memory Devices

2018 saw memory product manufacturers Samsung, Hynix, Toshiba and Micron introducing 64- or 72- stacked layer 3D-NAND devices, and move into 1x generation DRAM devices.

This presentation will examine some of the different structures we have seen through the evolution of these technologies, in particular the latest 3D-NAND and DRAM parts. We will also look at several historical applications of ALD/ALE technology that have been observed through reverse engineering. We will highlight the importance of ALD/ALE process in advanced logic devices. In many cases, the technology could not have advanced without the implementation of ALD technology.

Information and registration: LINK



Tuesday, October 6, 2020

Heads up ALD-people! On Thursday the ALD Symposium at PRiME2020 start and it is FOR FREE!

This week, the Virtual PRiME 2020 Joint International Meeting will be held under the auspices of 

The Electrochemical Society (ECS)The Electrochemical Society of Japan (ECSJ), and The Korean Electrochemical Society (KECS).

Over 75% of the 3,300+ original abstracts, meant for presentation in Honolulu (Hawaii) this week, are available as digital presentations.

On the online program you can find all info on the presentation files (video, slides, and/or posters).

These can be viewed on-demand in open-access mode, from Oct. 4 – Nov. 9, 2020.

Attendance and participation in PRiME 2020 is FREE and OPEN TO ALL! Only your pre-registration is required.

This includes Symposium G02 that I co-organized: G02 - Atomic Layer Deposition Applications 16.

See the information below for some more general info on our ALD symposium, also on the live sessions on Oct. 7 and 8, Hawaii HST time (!))  

We were sponsored by




Monday, August 24, 2020

TechInsights ALD/ALE Process in Commercially Available Logic Devices

2018 saw the introduction of a new generation of logic products featuring finFET transistors headlined by Intel with their 10 nm generation microprocessor, followed by TSMC and Samsung towards the end of the year with their 7 nm node devices. 

 

This presentation on the Atomic Layer Deposition/Atomic Layer Etching (ALD/ALE) process examines some of the different structures we have seen during the evolution of these logic technologies, in particular the latest 7 nm and 10 nm devices. We also discuss several historical applications of ALD/ALE technology that have been observed through reverse engineering, and we highlight the importance of ALD/ALE process in advanced logic devices. In many cases, the technology could not have advanced without the implementation of ALD/ALE. 

Register here: LINK

Monday, January 20, 2020

Forge Nano Webinar - Lab Scale ALD on powders with PROMETHEUS

Forge Nano has started to provide free ALD Webinars given live as well as playback thru their website: LINK

FREE ALD Webinar - Lab Scale ALD on powders with PROMETHEUS
  • Join the ALD experts at Forge Nano for a free webinar on Jan. 30th @ 10:00am MST.
  • Join us as our experts demonstrate our Lab-Scale ALD tool- PROMETHEUS.
  • Get an up-close and personal look at the features and functionality of PROMETHEUS.


PROMETHEUS is a Lab-Scale, Particle ALD research tool like no other. Featuring a simple to use interface, ergonomic and intuitive design, and various reactor sizes and configurations.

Previous Webinar - ALD Basics – ALD on powders (LINK)












Friday, November 9, 2018

Introductory lecture on ALD available as "Panopto" lecture capture, and slides in SlideShare

Introductory lecture on ALD available as "Panopto" lecture capture, and slides in SlideShare by Prof. Riikka Puurunen, Aalto University, Finland.

SlideShare : LINK

Panopto Open Teaching Video : LINK

Thursday, May 24, 2018

NEW! AVS Short Course Webinar on Atomic Layer Etching (ALE)

Atomic Layer Etching (ALE):
June 13,2018
REGISTRATION DEADLINE: June 11, 2018
The AVS Short Course Webinar focusing on Atomic Layer Etching (ALE) will be held on Wednesday, June 13, 2018 from 1:00-5:00 p.m (EDT). This webinar will be taught by Steven M. George, Professor in the Dept. of Chemistry & Biochemistry and Dept. of Mechanical Engineering, University of Colorado at Boulder. This AVS Webinar on ALE will provide the training required to understand plasma-assisted ALE and thermal ALE. The webinar will explain the process strategies for plasma-assisted ALE and thermal ALE. Important ALE approaches for many materials including Si, SiO2, Al2O3, TiN and W will be described that are useful for advanced semiconductor processing.

Who should attend: Scientists, engineers and technicians who use or plan to use atomic layer etching for atomic scale fabrication.

Syllabus: Learn More

Date: June 13, 2018

Time: 1:00-5:00 p.m. (EDT)

Cost: $200/person

REGISTRATION DEADLINE: June 11, 2018


Questions: E-mail heather@avs.org or call 530-896-0477.

Tuesday, April 10, 2018

AVS Short Course Webinar on Atomic Layer Etching (ALE) June 13,2018


Atomic Layer Etching (ALE):
June 13,2018
REGISTRATION DEADLINE: June 11, 2018
The AVS Short Course Webinar focusing on Atomic Layer Etching (ALE) will be held on Wednesday, June 13, 2018 from 1:00-5:00 p.m (EDT). This webinar will be taught by Steven M. George, Professor in the Dept. of Chemistry & Biochemistry and Dept. of Mechanical Engineering, University of Colorado at Boulder. This AVS Webinar on ALE will provide the training required to understand plasma-assisted ALE and thermal ALE. The webinar will explain the process strategies for plasma-assisted ALE and thermal ALE. Important ALE approaches for many materials including Si, SiO2, Al2O3, TiN and W will be described that are useful for advanced semiconductor processing.

Who should attend: Scientists, engineers and technicians who use or plan to use atomic layer etching for atomic scale fabrication.

Syllabus: Learn More

Date: June 13, 2018

Time: 1:00-5:00 p.m. (EDT)

Cost: $200/person

REGISTRATION DEADLINE: June 11, 2018


Questions: E-mail heather@avs.org or call 530-896-0477.

Thursday, April 5, 2018

FREE webinar: Optimising ALD high-k oxides for novel applications

FREE webinar: Optimising ALD high-k oxides for novel applications, 19 April 2018, 15:50 UTC [LINK]


Dr Harm Knoops and special guest speaker, Dr Uwe Schroeder, Deputy Scientific Director from NaMLab GmbH Dresden, Germany, will talk you through the ALD of ferroelectric HfO2 for novel memory applications and the tuning properties of TiO2 and HfO2 by substrate biasing during Plasma ALD.

The webinar will comprise of two talks, with a Q&A session at the end. Register here


Dr.ir. Knoops is the Atomic Scale Segment Specialist  for Oxford Instruments Plasma Technology and holds a part-time researcher position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD and similar techniques. His main goals are to improve and advance ALD processes and applications for Oxford Instruments and its customers. He has authored and co-authored more than 30 technical papers in peer-reviewed journals.  

Dr Uwe Schroeder has held the Deputy Scientific Director position at NaMLab GmbH, Dresden, Germany since 2009. His main research topics are material properties of ferroelectric hafnium oxide and the integration of the material into future devices.

Prior to joining NaMLab, Schroeder was in a Senior Staff Scientist position at Qimonda, previously known as Infineon Technologies (Memory Division) and Siemens Semiconductor before.  At Infineon’s Memory Development Center in Dresden, his research included work on high k dielectric and its integration into DRAM capacitors as a project manager. During this work the so far unknown ferroelectric properties of doped HfO2 based dielectrics were found. He focused on a detailed understanding of these new material properties and their integration into memory devices. 

Schroeder received a Master degree in Physics and a PhD degree in Physical Chemistry field from University of Bonn, Germany including a research visit at UC California, Berkeley and worked at University of Chicago as a post-doctoral researcher.

Thursday, March 1, 2018

Beneq offers online training in Atomic Layer Deposition

Train yourself online on ALD  - Introducing Beneq Thin Film Solutions webinar series


As experts of Atomic Layer Deposition and thin film coatings, we get a lot of questions about ALD from our customers and partners as well as students and other people with an interest in nanotechnology. The questions and information requests range from very general questions about the ALD technology and its application possibilities to extremely detailed thin film research problems. 
 
 
We will of course try to help the best we can, but it is not always possible to answer personally to everybody, which is why we try to share information about the benefits of ALD in our blog and the technology and research pages of our website.
 
1. Beneq TFS 200 ALD research equipment - Options and Upgrades
Wednesday, March 21st at 3.00 PM EET

In this webinar, Timo Rantasalmi, Head of Customer Services, will walk you through the available option and upgrades with concrete examples of their use and benefits.

2. Introduction to Beneq Coating Services
Wednesday, April 4th at 3.00 PM EET

In this webinar, Dr. Erik Østreng, Head of Coating Services, will explain the benefits of using Beneq Coating Services, introduce the typical coating service solutions and tell you how to get started.

Beneq Webinar Page for full details LINK

 

Sunday, January 28, 2018

Atomic Layer Deposition (ALD): Basic Principles, Characterizations, and Applications

Thursday, March 15, 2018, 1:00-5:00 p.m. (EDT)

The AVS Short Course Webinar focusing on on Atomic Layer Deposition (ALD) will be held on Thursday March 15 at 1:00 PM eastern time. This webinar will be taught by AVS Instructor, Robert K. Grubbs. Dr. Grubbs has been working in the field ALD for 20 years and has applied the ALD process to solve myrid technical challenges in the semiconductor industry and in the area of national security (Principal Member of the Technical Staff at Sandia National Laboratories).
 
This webinar on Atomic Layer Deposition (ALD) is for anyone who wants to know specific details about how the ALD process works and how to implement ALD in a laboratory setting. The webinar will cover the basic aspects of the chemical mechanism of ALD and how that leads to the unique and potent properties of an ALD process. Multiple examples of ALD chemistry will be covered as well as reactor design, chemical precursor properties, plasma ALD, and molecular layer deposition (MLD).

Registration: LINK
 
 

Wednesday, August 30, 2017

Webinar - ALD for 2D materials

Oxford Instruments is running a webinar on ALD for 2D materials & devices on 14 September, 3:30pm (UK time). The webinar will comprise of two talks, with a Q&A session at the end:
  • Atomic Layer Deposition for Graphene devices by Dr Daniel Neumaier, AMO GmbH
  • Atomic Layer Deposition on and of 2D materials by Dr Harm Knoops, Oxford Instruments
If you would like to register please visit www.oxinst.com/ALD2D


Wednesday, June 14, 2017

Atomic Scale Processing Webinar with Oxford Instruments

Last chance to register! FREE webinar tomorrow:
Atomic Scale Processing | 15th June, 3:30pm BST


In this webinar, our experts Dr Ravi Sundaram and Dr Harm Knoops discuss the processing of atomic scale materials and devices including Graphene and 2D materials, atomic layer etching and atomic layer deposition. The webinar will comprise of two talks, with a Q&A session at the end:

• Atomic scale processing: Atomic Layer Deposition & Etching
Dr Harm Knoops

• Processing of atomic scale materials & devices: Graphene & 2D
materials | Dr Ravi Sundaram


Wednesday, March 8, 2017

Webinar on Atomic Layer Deposition (ALD) Market Analysis

Description

A Webbinat by IndustryARC Nearly the last 5 decades have witnessed Atomic Layer Deposition successfully applied in the growth of thin films of many classes of materials, including metal oxides, metals, polymers, and inorganic-organic hybrid materials. ALD has paved its way across a large section of industries be it medical or biological or semiconductor or for laboratory purposes. While the development of biosensors, drug delivery devices and implants lead the lifesciences domain; manufacturing of electronic circuit components is one of the top most uses of ALD in the electronics segment.

Date and Time

Thu, March 23, 2017
7:30 PM – 8:30 PM SST
Registration: LINK

Samsung Relies on ALD for Continued Scaling of DRAM for 10nm Class Technology:

With DRAM memory, where each cell consists of a capacitor and a transistor linked to one another, scaling is more difficult than with NAND Flash memory in which a cell only needs a transistor. To continue scaling for more advanced DRAM, Samsung refined its design and manufacturing technologies and came up with a modified double patterning and atomic layer deposition.

The Fuel Cell and ALD Overhaul:

ALD has clearly gained prominence in manufacture of fuel cell. IndustryARC predicts high potential in this field in the coming years. Solid Oxide Fuel Cells are noted a quality contribution to the global ALD market:

Durable and high-performance low temperature solid oxide fuel cells
ALD of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate

Supercapacitors Manufacturing: ALD to the Rescue?

With the invent of ALD, energy conversion, producing cost competitive, durable and high performance devices have become increasingly significant and one such application is manufacture of a supercapacitor! Manufacturers, developers and suppliers of supercapacitors have lately gained utmost ascendancy. ALD encapsulated activated carbon electrodes for high voltage stable supercapacitors- continue to trend in the market.

Wednesday, November 16, 2016

Oxford Instruments Plasma Technology free webinars

Oxford Instruments Plasma Technology has a new media centre that has just gone live, allowing you unlimited access to their on-demand webinars, videos and more!

The two most recent webinars:

Growth and Characterisation of 2D Materials Beyond Graphene
Dr Ravi Sundaram, Oxford Instruments & Dr Tim Batten, Renishaw

SiC Via Etching for RF Devices
Oxford Instruments Plasma Technology 

Sunday, June 1, 2014

Webinar: Use of ALD for MEMS and NEMS Applications by Oxford Instrument Plasma Technology


Use of Atomic Layer Deposition for MEMS and NEMS Applications
Wednesday, July 2, 2014 11:30 AM - 12:30 PM EDT
Presented by Dr. Harm Knoops, Technical Sales Specialist (ALD) at Oxford Instrument Plasma Technology
 
 
Atomic layer deposition (ALD) with its growth control and unique properties can be used to grow an increasing variety of films in complex structures. As MEMS and NEMS applications are becoming more advanced, this webinar will discuss important aspect of ALD and how they can be applied to MEMS. Mechanical properties that are important for MEMS, such as stress, will be discussed for thermal and plasma ALD. Several examples from the literature of how ALD films can be used in MEMS applications will be demonstrated and discussed.
 
 
Dr. Harm Knoops presenting at the High-k workshop organized by NaMLab in Dresden, March 2014.
 
Dr. Harm Knoops, Technical Sales Specialist (ALD) at Oxford Instrument Plasma Technology. Before his current position, Harm investigated the fundamentals and applications of atomic layer deposition (ALD) at the Eindhoven University of Technology.
 
To register, please click here.

 

Monday, February 24, 2014

Webinar Taking Nano to the next level. Speakers from LBNL and Seagate!

Webinar "Taking Nano to the next level" on 26th March 2014 Presented by keynote industry speakers. Hosted by the IOP on Wed 26th March at 5pm (GMT), 9am Pacific Time.
 

This webinar is free of charge, and will run for 1 hour including time for questions and answers at the end. A focus on recent nanoscale etch and atomic layer deposition (ALD) advances from research to
manufacturing applications, from industry leading speakers: 

Talk 1: ALD and nanoscale etch processing techniques and results from recent work carried out at Lawrence Berkeley National Laboratory (LBNL), USA

Speaker: Deirdre Olynick, Staff Scientist, LBNL, CA, USA

Talk 2: Data storage, an expanding market application that has benefited from advanced ALD and nanoscale etch techniques

Speaker: Kim Lee, Seagate, CA, USA