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Atomic Layer Etching (ALE):
June 13,2018
REGISTRATION DEADLINE: June 11, 2018
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The AVS Short Course Webinar focusing on Atomic Layer Etching (ALE) will
be held on Wednesday, June 13, 2018 from 1:00-5:00 p.m (EDT). This
webinar will be taught by Steven M. George, Professor in the Dept. of
Chemistry & Biochemistry and Dept. of Mechanical Engineering,
University of Colorado at Boulder. This
AVS Webinar on ALE will provide the training required to understand
plasma-assisted ALE and thermal ALE. The webinar will explain the
process strategies for plasma-assisted ALE and thermal ALE. Important
ALE approaches for many materials including Si, SiO2, Al2O3, TiN and W will be described that are useful for advanced semiconductor processing.
Who should attend: Scientists, engineers and technicians who use or plan to use atomic layer etching for atomic scale fabrication.
Date: June 13, 2018
Time: 1:00-5:00 p.m. (EDT)
Cost: $200/person
REGISTRATION DEADLINE: June 11, 2018
Questions: E-mail heather@avs.org or call 530-896-0477.
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