Sunday, June 1, 2014

Webinar: Use of ALD for MEMS and NEMS Applications by Oxford Instrument Plasma Technology

Use of Atomic Layer Deposition for MEMS and NEMS Applications
Wednesday, July 2, 2014 11:30 AM - 12:30 PM EDT
Presented by Dr. Harm Knoops, Technical Sales Specialist (ALD) at Oxford Instrument Plasma Technology
Atomic layer deposition (ALD) with its growth control and unique properties can be used to grow an increasing variety of films in complex structures. As MEMS and NEMS applications are becoming more advanced, this webinar will discuss important aspect of ALD and how they can be applied to MEMS. Mechanical properties that are important for MEMS, such as stress, will be discussed for thermal and plasma ALD. Several examples from the literature of how ALD films can be used in MEMS applications will be demonstrated and discussed.
Dr. Harm Knoops presenting at the High-k workshop organized by NaMLab in Dresden, March 2014.
Dr. Harm Knoops, Technical Sales Specialist (ALD) at Oxford Instrument Plasma Technology. Before his current position, Harm investigated the fundamentals and applications of atomic layer deposition (ALD) at the Eindhoven University of Technology.
To register, please click here.


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