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Stanford University present a ALD chamber for in-situ x-ray diffraction and scattering installed at SLAC National Accelerator Laboratory, Stanford Synchrotron Radiation Lightsource. The in-situ ALD chamber is designed for studying the structural properties of thin films during growth by high resolution XRD, GIXRD, and GISAXS. The ability to monitor the growth of an ALD material from nucleation to the formation of continuous films has been shown, and the precision to measure changes to the structure following single half-cycles has been demonstrated. According to the researchers, the design can also be adapted x-ray reflectivity (XRR) and x-ray absorption and fluorescence spectroscopy (XAFS). For all details please go ahead and access the all free content of the publication below.
The Stanford Synchrotron Radiation Lightsource (SSRL), a directorate of the SLAC National Accelerator Laboratory, is an Office of Science User Facility operated for the U.S. Department of Energy by Stanford University. SSRL provides synchrotron radiation, a name given to X-rays or light produced by electrons circulating in a storage ring at nearly the speed of light. These extremely bright X-rays can be used to investigate various forms of matter ranging from objects of atomic and molecular size to man-made materials with unusual properties. (news.slac.stanford.edu, Photo by Brad Plummer)
An atomic layer deposition chamber for in situ x-ray diffraction and scattering analysis
Scott M. Geyer, Rungthiwa Methaapanon, Richard W. Johnson, Woo-Hee Kim, Douglas G. Van Campen, Apurva Metha and Stacey F. Bent
Rev. Sci. Instrum. 85, 055116 (2014); http://dx.doi.org/10.1063/1.4876484
Abstract: The crystal structure of thin films grown by atomic layer deposition (ALD) will determine important performance properties such as conductivity, breakdown voltage, and catalytic activity. We report the design of an atomic layer deposition chamber for in situ x-ray analysis that can be used to monitor changes to the crystal structural during ALD. The application of the chamber is demonstrated for Pt ALD on amorphous SiO2 and SrTiO3 (001) using synchrotron-based high resolution x-ray diffraction, grazing incidence x-ray diffraction, and grazing incidence small angle scattering.
The Stanford Synchrotron Radiation Lightsource (SSRL), a directorate of the SLAC National Accelerator Laboratory, is an Office of Science User Facility operated for the U.S. Department of Energy by Stanford University. SSRL provides synchrotron radiation, a name given to X-rays or light produced by electrons circulating in a storage ring at nearly the speed of light. These extremely bright X-rays can be used to investigate various forms of matter ranging from objects of atomic and molecular size to man-made materials with unusual properties. (news.slac.stanford.edu, Photo by Brad Plummer)
An atomic layer deposition chamber for in situ x-ray diffraction and scattering analysis
Scott M. Geyer, Rungthiwa Methaapanon, Richard W. Johnson, Woo-Hee Kim, Douglas G. Van Campen, Apurva Metha and Stacey F. Bent
Rev. Sci. Instrum. 85, 055116 (2014); http://dx.doi.org/10.1063/1.4876484
Abstract: The crystal structure of thin films grown by atomic layer deposition (ALD) will determine important performance properties such as conductivity, breakdown voltage, and catalytic activity. We report the design of an atomic layer deposition chamber for in situ x-ray analysis that can be used to monitor changes to the crystal structural during ALD. The application of the chamber is demonstrated for Pt ALD on amorphous SiO2 and SrTiO3 (001) using synchrotron-based high resolution x-ray diffraction, grazing incidence x-ray diffraction, and grazing incidence small angle scattering.
a) Cartoon depiction of the in situ XRD chamber. (b) Depiction of the heater assembly with bridge mount and base plate. Citation: Rev. Sci. Instrum. 85, 055116 (2014); http://dx.doi.org/10.1063/1.4876484
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