AVS Short Course Webinar on Atomic Layer Etching (ALE) June 13,2018

Atomic Layer Etching (ALE): June 13,2018 REGISTRATION DEADLINE: June 11, 2018

The AVS Short Course Webinar focusing on Atomic Layer Etching (ALE) will be held on Wednesday, June 13, 2018 from 1:00-5:00 p.m (EDT). This webinar will be taught by Steven M. George, Professor in the Dept. of Chemistry & Biochemistry and Dept. of Mechanical Engineering, University of Colorado at Boulder. This AVS Webinar on ALE will provide the training required to understand plasma-assisted ALE and thermal ALE. The webinar will explain the process strategies for plasma-assisted ALE and thermal ALE. Important ALE approaches for many materials including Si, SiO2, Al2O3, TiN and W will be described that are useful for advanced semiconductor processing. Who should attend: Scientists, engineers and technicians who use or plan to use atomic layer etching for atomic scale fabrication. Syllabus: Learn More► Date: June 13, 2018 Time: 1:00-5:00 p.m. (EDT) Cost: $200/person REGISTRATION DEADLINE: June 11, 2018 REGISTER HERE Questions: E-mail heather@avs.org or call 530-896-0477.