Monday, March 31, 2014

Altatech has recieved an order for a CVD system to University of Washington

As reported today in a press release from Altatech, a subsidiary of Soitec, has received an order from the University of Washington in Seattle for an AltaCVD(TM) chemical vapor deposition (CVD) system whose unique combination of capabilities allows users to develop new process materials with high added value. The Altatech's CVD system will be installed at the university's Washington Nanofabrication Facility (WNF), where it will be used by both internal and external researchers in fabricating a broad range of semiconductor-based devices including leading-edge CMOS transistors, MEMS, ICs built with the latest in through-silicon-via (TSV) technology, advanced LEDs and solar cells.

Key features of an Altatech CVD Chamber :


  • Standalone chamber or cluster tool capability with industry standard vacuum handling platform
  • Up to three chambers on one platform (150-200 mm or 200-300 mm)
  • Low chamber volume for compatibility with ALD
  • Proprietary gas-distribution system design with dual channel showerhead for enhanced process performance and repeatability
  • Pulsed injection and vaporization of up to three liquid or diluted solid precursors, with fast activation valves < 20 ms
  • Non-contact and high-residence time vaporization for efficient and residue-free vapor formation
  • Up to 12 reactive gases (200-300 mm system)
  • Uniform substrate heating (< 1 %) up to 650 °C through the use of a ceramic resistive heater
  • 13.56 MHz RF generator for plasma-enhanced deposition
  • 350-450 kHz RF generator for ion-bombardment control
  • Automated liquid and gas delivery systems
  • Proprietary PLC control software and user interface

 
Dr. Michael Khbeis, acting director of the WNF, claims, "The AltaCVD system provides a unique capability that enables researchers to deposit conformal metal films for TSV applications as well as metal oxides and nitrides for high-k dielectrics and piezoelectric materials. The higher deposition rate enabled by pulsed CVD makes ALD (atomic layer deposition) films a tractable solution for scale-up paths toward high-volume manufacturing for our researchers and industrial clients. This ensures a viable pathway from academia to real economic impact in our region."
 
The University of Washington - Washington Nanofabrication Facility (WNF) is a national user facility that is a part of the National Nanotechnology Infrastructure Network (NNIN). Located on the University of Washington, Seattle campus, WNF is a full-service micro- and nanotechnology user facility and is the largest public access fabrication center in the Pacific Northwest, with 15,000 square feet of laboratories, cleanrooms, and user spaces focused on enabling basic and applied research, advanced research and development, and prototype production.

Check out the video below to learn more about WNF.