Sunday, March 2, 2014

Levitech BV sells a Levitrack® ALD system to one of Taiwan’s largest solar cell makers and receives repeat order for second ALD system

According to a press realse today Levitech BV "announced that one of Taiwan’s largest solar cell manufacturers transferred a Levitrack Atomic Layer Deposition (ALD) system to manufacturing, and placed an order for a second Levitrack system to be shipped in the second quarter."

“The Levitrack has a proven record in high volume manufacturing and our customer was satisfied with the excellent performance. They decided to order a second system for their expansion for the production of high-efficiency crystalline solar cells. This system will be used for PERC cells - with efficiencies exceeding 20% - , as well as multi-crystalline and n-type products”, said Jaap Beijersbergen, CEO of Levitech.

“This client chose our Levitrack ALD system based on its significant productivity, cost-of-ownership and process advantages over competitive PECVD and ALD systems for aluminum oxide (Al2O3) applications, Beijersbergen concluded.

The Levitrack’s unique spatial ALD process and high throughput result in a superior cost-of-ownership of the overall passivation process flow and helps any client to address current and future technology needs.

Here are some insights from the Levitech web and a YouTube movie (below) into how their Spatial ALD Technology works:

1) The Levitrack™ ALD system is based on the new concept of precursor separation in space, as opposed to time, in combination with the unique floating wafer and conductive heating technology used in the Levitor RTP products. Substrates are floating in a linear gas track, and are heated to the required process temperature (below 300°C) within a matter of seconds. [screendump from youtube movie below]

2) At process temperature, the substrates float through a series of ALD deposition cells. Each cell consists of 2 precursors, which are separated in space by a Nitrogen purge (acting as inert gas curtains).A sequence of precursor 1, Nitrogen purge, precursor 2, and again, Nitrogen purge will result in the deposition of 1 monolayer. The number of active ALD deposition cells depends on the required layer thickness. [screendump from youtube movie below]

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