Friday, March 7, 2014

SoLayTec's Ultra Fast Spatial ALD and motion of wafers by the double floating principle

As reported earlier, Levitech has sipped Spatial ALD equipment to an Asian customer. Levitech is in strong competition with another Dutch Spatial ALD equipment manufacturer, SoLayTec based in Eindhoven. SoLayTec offers a modular concept, either the InPassion LAB tool for optimizing the cell design or an InPassion ALD tool for customers that are already integrating ALD into their production. One advantage is that both products are based on identical core process modules. This makes it easy to ramp-up from low to high volume production.

The user is flexible in choosing a certain recipe, thus adjusting process parameters like layer thickness, precursor flow and deposition temperature  The InPassion ALD consists of 4, 6 or 8 deposition units and has a throughput up to 4500 wph. For maximizing uptime, the tool continues production during a failure of one deposition unit.

(a) In spatial ALD the TMA and H2O steps are separated in space by an inert gas (in this case N2). (b) In the deposition unit the wafer oscillates underneath the spatial ALD injector head. (c) The InPassion ALD features two main conveyors  that feeds various ALD units at either side of the conveyor.
See more at: or check out the promotion video below available on Youtube.

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