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Plasma assisted atomic level processing – PEALD & ALE
Sunday, September 16, 2018
The focus will be on atomic level processing technologies, such as
Plasma Enhanced Atomic Layer Deposition (PEALD) and Atomic Layer Etching
(ALE). The tutorial will provide the basics of the processes, but also
insights into the fundamentals of processes, as well as an overview of
the processing equipment and applications of these leading edge
technologies.
The tutorial will be organized by Adriana Creatore, TU Eindhoven, in cooperation with Jonas Sundqvist, Fraunhofer IKTS.
Garmisch-Partenkirchen, Germany (source: panoramio, Wikipedia)
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