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— AVSALD (@AvsAld) January 3, 2018
The
AVS 18th International Conference on Atomic Layer Deposition (ALD 2018)
featuring the
5th International Atomic Layer Etching Workshop (ALE 2018)
will
be a three-day meeting dedicated to the science and technology of
atomic layer controlled deposition of thin films and now topics related
to atomic layer etching. The conference will take place
Sunday, July 29-Wednesday, August 1, 2018
, at the Songdo Convensia in Incheon, South Korea.
As in
past conferences, the meeting will be preceded (Sunday, July 29) by one
day of tutorials and a welcome reception. Sessions will take place
(Monday-Wednesday, July 30-August 1) along with an industry tradeshow.
All presentations will be audio-recorded and provided to attendees
following the conference (posters will be included as PDFs). Anticipated
attendance is 600+.
Key Deadlines:
Abstract Submission Deadline: February 16, 2018
Author Acceptance Notifications: April 9, 2018
Student Award Applications Deadline: May 1, 2018
Early Registration Deadline: June 1, 2018
Hotel Reservation Deadline: June 26, 2018
JVST Special Issue Deadline: September 5, 2018
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