Thursday, November 10, 2016

AVS ALD2017 has come on line with an updated web page!

AVS ALD2017 has come on line with an updated web page and a lot of information! Please go ahead and check it out here.

The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Workshop (ALE 2017) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2017 Workshop (ALE 2017), so that attendees can interact freely. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA.


Today Riikka Puurunen was announced as Session chair for Social Media, which is a great initiative and the first time for this conference series. The twitter hashtag will be #ALDALE2017 to include the ALE2017 workshop as well.