Showing posts with label ALD2017. Show all posts
Showing posts with label ALD2017. Show all posts

Thursday, July 13, 2017

On the road to Denver for ALD2017?

Twitter is heating up with announcements of people and companies going to the ALD2017 conference in Denver 15 to 18 of July. Here is a selection of some of them. Please take a chance to download the conference app (see tweet below)













Sunday, June 18, 2017

ALD/ALE2017 Mobile App

Soon it is time for the next major event for the ALD and ALE community - ALD/ALE2017 in Denver Colorado. You can download the Mobile App for Android and Iphone here : LINK.


Tuesday, May 30, 2017

The AVS ALD2017/ALE2017 schedule and book of abstracts is now available online

The AVS ALD2017/ALE2017 schedule and book of abstracts is now available online & technical program:  



The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017)  will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2017 Workshop (ALE 2017), so that attendees can interact freely. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA. 

Monday, February 6, 2017

ALD2017 & ALE 2017 Joint Tutorial, Denver, USA

The joint tutorials for AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017) has been released with a great line up. As in past years, the tutorials will be taking place the day before the actual conference (Saturday, July 15).



ALD & ALE 2017 Tutorial Speakers [LINK]

David Emslie (McMaster Univ.), “ALD Precursors, Precursor Design, Chemistry and Mechanisms”

Adrie Mackus (Eindhoven Univ. of Technology), “Approaches, Challenges, and Opportunities for Area-selective ALD”

Mato Knez (Nanogune), “Coating of Physically and Chemically Challenging Substrates”

Simon Elliott (Tyndall National Institute), “What Theory Can Tell us About ALD Mechanism”

Vincent Donnelly (University of Houston), “History of Plasma Etching”

Geun Young Yeom (Sungkyunkwan Univ.), “Atomic Layer Etching with Ion/Neutral Beams

Sunday, February 5, 2017

Abstract subnission deadline for ALD2017 Denver USA coming up FEB 17th

The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017) (Download PDF Flyer) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. 


This year, the ALD conference will again incorporate the Atomic Layer Etching 2017 Workshop (ALE 2017), so that attendees can interact freely. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA.


As in past conferences, the meeting will be preceded (Saturday, July 15) by one day of tutorials and a welcome reception. Sessions will take place (Sunday-Tuesday, July 16-18) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.

Tuesday, January 10, 2017

Abstract Deadline Feb 17 for ALD & ALE 2017 in Denver Colorado

17th International Conference on Atomic Layer Deposition
-Featuring the 4th International Atomic Layer Etching Workshop (ALE2017)- 
 
 
DATE & LOCATION:
July 15-18, 2017 Sheraton Denver, Denver, Colorado 
 
ALD 2017 will be a three-day meeting (preceded by a one day tutorial), dedicated to the science and technology of atomic layer controlled deposition of thin films. Once again the meeting will feature the Atomic Layer Etching Workshop. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations will available online.

ABSTRACT DEADLINE:
February 17, 2017

WEBSITE:
Details will be posted to the ALD 2017 Website in November 2016. Bookmark: www.ald-avs.org

Saturday, December 17, 2016

Abstract submission is open for ALD 2017

Abstract submission is open for ALD 2017  and the Abstract Deadline is February 17, 2017. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA.

LINK : https://aldconference.avs.org/abstract-submission/


Tuesday, November 29, 2016

4th Int. Atomic Layer Etching Workshop ALE2017 in Denver USA July 15-17

Here is a message and update from Steve George and Keren Kanarik Co-Chairs of ALE2017:

ALE2017 will be held in conjunction with the 17th International Conference on Atomic Layer Deposition in Denver, Colorado. ALE2017 is scheduled on July 15-17, 2017. Preliminary details are posted at: https://aldconference.avs.org/.





ALE2017 will embrace many topics including:

  • Plasma and/or energy-enhanced ALE
  • Gas-phase and/or thermal ALE
  • Solution-based including wet ALE
  • Selective ALE
  • ALE hardware, diagnostics, & instrumentation
  • Modeling of ALE
  • Atomic layer cleaning (ALC)
  • Integration of ALD + ALE
  • Applications for ALE
Confirmed invited speakers for ALE2017 that will cover many of the above topics:
  • Rick Gottscho (Lam Research)
  • Mark Kushner (Univ. Michigan)
  • Masanobu Honda (Tokyo Electron)
  • Nathan Marchack (IBM)
  • Jesus Del Alamo (MIT)
  • Jane Chang (UCLA)
  • Stacey Bent (Stanford Univ.)
  • Chuck Winter (Wayne State Univ.)
  • Younghee Lee (Univ. Colorado)
ALE2017 will begin with a poster session in the evening on July 15. The plenary talks for both ALD2017 and ALE2017 are on the morning of July 16. Rick Gottscho, Executive Vice President of Global Products from Lam Research, will be presenting the ALE Plenary talk. The invited and contributed talks for ALE2017 will continue on July 16-17. In addition, there will be a networking area devoted to ALE next to the ALE posters

The abstract submission deadline for ALE2017 is February 17, 2017.



Thursday, November 10, 2016

AVS ALD2017 has come on line with an updated web page!

AVS ALD2017 has come on line with an updated web page and a lot of information! Please go ahead and check it out here.

The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Workshop (ALE 2017) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2017 Workshop (ALE 2017), so that attendees can interact freely. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA.


Today Riikka Puurunen was announced as Session chair for Social Media, which is a great initiative and the first time for this conference series. The twitter hashtag will be #ALDALE2017 to include the ALE2017 workshop as well.



Friday, August 5, 2016

ALD 2017 Denver, Colorado July 15-18

ALD 2017: 
17th International Conference on Atomic Layer Deposition - Featuring the Atomic Layer Etching Workshop-




Web: http://www2.avs.org/conferences/ALD/2017/


DATE & LOCATION:  
July 15-18, 2017

Sheraton Denver, Denver, Colorado
Please note that this year’s Tutorial will be held on Saturday and Sessions and Exhibits will be held Sunday-Tuesday.  
Click here to learn more about the venue

SCOPE:
ALD 2017 will be a three-day meeting (preceded by a one day tutorial), dedicated to the science and technology of atomic layer controlled deposition of thin films. Once again the meeting will feature the Atomic Layer Etching Workshop. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations will available online.
ABSTRACT DEADLINE: 
February 17, 2017 
WEBSITE:
Details will be posted to the ALD 2017 Website in November 2016.
Bookmark: www.ald-avs.org

PROGRAM CHAIRS:
QUESTIONS:
Contact Della Miller, AVS, 530-896-0477, della@avs.org